Discovery of a Single-Band Mott Insulator in a van der Waals Flat-Band Compound
Abstract
The Mott insulator provides an excellent foundation for exploring a wide range of strongly correlated physical phenomena, such as high-temperature superconductivity, quantum spin liquid, and colossal magnetoresistance. A Mott insulator with the simplest degree of freedom is an ideal and highly desirable system for studying the fundamental physics of Mottness. In this study, we have unambiguously identified such an anticipated Mott insulator in a van der Waals layered compound Nb3Cl8. In the high-temperature phase, where interlayer coupling is negligible, density functional theory calculations for the monolayer of Nb3Cl8 suggest a half-filled flat band at the Fermi level, whereas angle-resolved photoemission spectroscopy experiments observe a large gap. This observation is perfectly reproduced by dynamical mean-field theory calculations considering strong electron correlations, indicating a correlation-driven Mott insulator state. Since this half-filled band derived from a single 2a1 orbital is isolated from all other bands, the monolayer of Nb3Cl8 is an ideal realization of the celebrated single-band Hubbard model. Upon decreasing the temperature, the bulk system undergoes a phase transition, where structural changes significantly enhance the interlayer coupling. This results in a bonding-antibonding splitting in the Hubbard bands, while the Mott gap remains dominant. Our discovery provides a simple and seminal model system for investigating Mott physics and other emerging correlated states.
Keywords
Cite
@article{arxiv.2205.11462,
title = {Discovery of a Single-Band Mott Insulator in a van der Waals Flat-Band Compound},
author = {Shunye Gao and Shuai Zhang and Cuixiang Wang and Shaohua Yan and Xin Han and Xuecong Ji and Wei Tao and Jingtong Liu and Tiantian Wang and Shuaikang Yuan and Gexing Qu and Ziyan Chen and Yongzhao Zhang and Jierui Huang and Mojun Pan and Shiyu Peng and Yong Hu and Hang Li and Yaobo Huang and Hui Zhou and Sheng Meng and Liu Yang and Zhiwei Wang and Yugui Yao and Zhiguo Chen and Ming Shi and Hong Ding and Huaixin Yang and Kun Jiang and Yunliang Li and Hechang Lei and Youguo Shi and Hongming Weng and Tian Qian},
journal= {arXiv preprint arXiv:2205.11462},
year = {2023}
}
Comments
23 pages, 4 figures, and the Supplemental Material