English

Consideration of arrayed $e$-beam microcolumn based systems potentialities for wafer defects inspection

Instrumentation and Detectors 2008-05-05 v1

Abstract

The ee-beam column which is intended on defects inspection is considered. The defects which are to be examined or potentially might be examined at inspection stage are briefly considered. Interrelations between the system parameters is ascertaining and the ways of optimization and the technical requirements to the system in whole are discussed. As a result, we find the optimal combinations of the system parameters for the purpose.

Keywords

Cite

@article{arxiv.0805.0248,
  title  = {Consideration of arrayed $e$-beam microcolumn based systems potentialities for wafer defects inspection},
  author = {V. V. Kazmiruk and T. N. Savitskaja},
  journal= {arXiv preprint arXiv:0805.0248},
  year   = {2008}
}

Comments

17 pages, 18 figures

R2 v1 2026-06-21T10:36:52.651Z