Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate
Optics
2025-01-22 v1 Applied Physics
Abstract
We report the fabrication of an 8-meter-long thin-film lithium niobate (TFLN) optical true delay line (OTDL) using the photolithography-assisted chemomechanical etching (PLACE) technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.
Cite
@article{arxiv.2501.11843,
title = {Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate},
author = {Yuan Ren and Boyang Nan and Rongbo Wu and Yong Zheng and Ruixue Liu and Yunpeng Song and Min Wang and Ya Cheng},
journal= {arXiv preprint arXiv:2501.11843},
year = {2025}
}