Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics
Abstract
Photolithography assisted chemo-mechanical etching (PLACE), a technique specifically developed for fabricating highquality large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled fabrication of a series of building blocks of PICs ranging from high-quality (high-Q) microresonators and low-loss waveguides to electrooptically (EO) tunable lasers and waveguide amplifiers. Aiming at high-throughput manufacturing of the PIC devices and systems, we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high repetition rate femtosecond laser and a high-speed polygon laser scanner, by which a lithography fabrication efficiency of 4.8 cm2/h has been achieved at a spatial resolution of 200 nm. We demonstrate wafer-scale fabrication of TFLN-based photonic structures, optical phase masks as well as color printing
Keywords
Cite
@article{arxiv.2303.00166,
title = {Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics},
author = {Jinming Chen and Zhaoxiang Liu and Lvbin Song and Chao Sun and Guanhua Wang and Ya Cheng},
journal= {arXiv preprint arXiv:2303.00166},
year = {2023}
}