Wafer-scale low-loss lithium niobate photonic integrated circuits
Applied Physics
2020-08-26 v1 Optics
Abstract
Thin-film lithium niobate (LN) photonic integrated circuits (PICs) could enable ultrahigh performance in electro-optic and nonlinear optical devices. To date, realizations have been limited to chip-scale proof-of-concepts. Here we demonstrate monolithic LN PICs fabricated on 4- and 6-inch wafers with deep ultraviolet lithography and show smooth and uniform etching, achieving 0.27 dB/cm optical propagation loss on wafer-scale. Our results show that LN PICs are fundamentally scalable and can be highly cost-effective.
Keywords
Cite
@article{arxiv.2007.06498,
title = {Wafer-scale low-loss lithium niobate photonic integrated circuits},
author = {Kevin Luke and Prashanta Kharel and Christian Reimer and Lingyan He and Marko Loncar and Mian Zhang},
journal= {arXiv preprint arXiv:2007.06498},
year = {2020}
}
Comments
5 pages, 4 figures