Lithography-free Kirchhoff's Metasurfaces
Optics
2020-03-24 v1 Applied Physics
Abstract
Lithography-free metasurfaces composed of a nano-layered stack of materials are attractive not only due to their optical properties but also by virtue of fabrication simplicity and cost reduction of devices based on such structures. We demonstrate a multi-layer metasurface with engineered electromagnetic absorption in the mid-infrared (MIR) wavelength range. Characterisation of thin SiO and Si films sandwiched between two Au layers by way of experimental absorption and thermal radiation measurements as well as finite difference time domain (FDTD) numerical simulations is presented. Comparison of experimental and simulation data of optical properties of multilayer metasurfaces show guidelines for the absorber/emitter applications.
Cite
@article{arxiv.2003.10080,
title = {Lithography-free Kirchhoff's Metasurfaces},
author = {Takuhiro Kumagai and Naoki To and Armandas Balcytis and Gediminas Seniutinas and Saulius Juodkazis and Yoshiaki Nishijima},
journal= {arXiv preprint arXiv:2003.10080},
year = {2020}
}
Comments
4 figures