Grayscale Electron Beam Lithography Direct Patterned Antimony Sulfide
Abstract
The rise of micro/nanooptics and lab-on-chip devices demands the fabrication of three-dimensional structures with decent resolution. Here, we demonstrate the combination of grayscale electron beam lithography and direct forming methodology to fabricate antimony sulfide structures with free form for the first time. The refractive index of the electron beam patterned structure was calculated based on an optimization algorithm that is combined with genetic algorithm and transfer matrix method. By adopting electron irradiation with variable doses, 4-level Fresnel Zone Plates and metalens were produced and characterized. This method can be used for the fabrication of three-dimensional diffractive optical elements and metasurfaces in a single step manner.
Cite
@article{arxiv.2401.13427,
title = {Grayscale Electron Beam Lithography Direct Patterned Antimony Sulfide},
author = {Wei Wang and Uwe Hübner and Tao Chen and Anne Gärtner and Joseph Köbel and Franka Jahn and Henrik Schneidwind and Andrea Dellith and Jan Dellith and Torsten Wieduwilt and Matthias Zeisberger and Tanveer Ahmed Shaik and Astrid Bingel and Markus A Schmidt and Jer-Shing Huang and Volker Deckert},
journal= {arXiv preprint arXiv:2401.13427},
year = {2024}
}
Comments
17 pages, 4 figures, 1 table, 1 scheme. The Supplement Information will be given in a second Arxiv submission or the published journal