English

Attention Consistency Refined Masked Frequency Forgery Representation for Generalizing Face Forgery Detection

Computer Vision and Pattern Recognition 2023-07-24 v1

Abstract

Due to the successful development of deep image generation technology, visual data forgery detection would play a more important role in social and economic security. Existing forgery detection methods suffer from unsatisfactory generalization ability to determine the authenticity in the unseen domain. In this paper, we propose a novel Attention Consistency Refined masked frequency forgery representation model toward generalizing face forgery detection algorithm (ACMF). Most forgery technologies always bring in high-frequency aware cues, which make it easy to distinguish source authenticity but difficult to generalize to unseen artifact types. The masked frequency forgery representation module is designed to explore robust forgery cues by randomly discarding high-frequency information. In addition, we find that the forgery attention map inconsistency through the detection network could affect the generalizability. Thus, the forgery attention consistency is introduced to force detectors to focus on similar attention regions for better generalization ability. Experiment results on several public face forgery datasets (FaceForensic++, DFD, Celeb-DF, and WDF datasets) demonstrate the superior performance of the proposed method compared with the state-of-the-art methods.

Keywords

Cite

@article{arxiv.2307.11438,
  title  = {Attention Consistency Refined Masked Frequency Forgery Representation for Generalizing Face Forgery Detection},
  author = {Decheng Liu and Tao Chen and Chunlei Peng and Nannan Wang and Ruimin Hu and Xinbo Gao},
  journal= {arXiv preprint arXiv:2307.11438},
  year   = {2023}
}

Comments

The source code and models are publicly available at https://github.com/chenboluo/ACMF

R2 v1 2026-06-28T11:36:47.025Z