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Related papers: Self - Organized Si Dots On Ge Substrates

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Self-assembled Ge islands were grown on stripe-patterned Si (001) substrates by solid source molecular beam epitaxy. The surface morphology obtained by atomic force microscopy (AFM) and cross-sectional transmission electron microscopy…

Materials Science · Physics 2009-11-10 Zhenyang Zhong , A. Halilovic , M. Muhlberger , F. Schaffler , G. Bauer

Si/Ge heteroepitaxial dots under tensile strain are grown on nanostructured Ge substrates produced by high-temperature flash heating exploiting the spontaneous faceting of the Ge(001) surface close to the onset of surface melting. A very…

Mesoscale and Nanoscale Physics · Physics 2019-04-18 L. Persichetti , M. Fanfoni , B. Bonanni , M. De Seta , L. Di Gaspare , C. Goletti , L. Ottaviano , A. Sgarlata

Growth of narrow-neck, epitaxial as well as non-epitaxial and nearly spherical Ge islands on air-exposed Si(111)-(7\times7) surfaces has been investigated by in-situ scanning tunnelling microscopy (STM) and ex-situ high resolution…

Mesoscale and Nanoscale Physics · Physics 2011-10-20 K. Bhattacharjee , A. Roy , S. Roy , J. Ghatak , S. Mathew , P. V. Satyam , B. N. Dev

The morphological evolution and the effect of growth temperature on size, orientation and composition of molecular beam epitaxy grown Ge-Si islands on Si(5 5 12) surfaces have been investigated in the temperature range from room temperature…

Materials Science · Physics 2012-12-06 J. K. Dash , A. Rath , R. R. Juluri , P. V. Satyam

In the Ge on Si model heteroepitaxial system, metal patterns on the silicon surface provide unprecedented control over the morphology of highly ordered Ge islands. Island shape including nanorods and truncated pyramids is set by the metal…

We demonstrate high-quality epitaxial germanium (Ge) films on a metallic silicide, Fe3Si, grown directly on a Ge(111) substrate. Using molecular beam epitaxy techniques, we can obtain an artificially controlled arrangement of silicon (Si)…

Materials Science · Physics 2012-10-04 S. Yamada , K. Tanikawa , M. Miyao , K. Hamaya

Metal deposition of Zr an a Si(001) surface has been studied by state-of-the-art electronic structure calculations. The energy per Zr adatom as a function of the coverage shows, that Zr forms silicide islands even at low coverages. Adsorbed…

Materials Science · Physics 2007-05-23 Clemens J. Foerst , Peter E. Bloechl , Karlheinz Schwarz

The reactive growth of cobalt germanide on Ge(001) was investigated by means of in-situ x-ray absorption spectroscopy photoemission electron microscopy (XAS-PEEM), micro-illumination low-energy electron diffraction ($\mu$-LEED), and ex-situ…

Materials Science · Physics 2016-02-16 M. Ewert , Th. Schmidt , J. I. Flege , I. Heidmann , T. Grzela , W. M. Klesse , M. Foerster , L. Aballe , T. Schroeder , J. Falta

Surface diffusion has an impact on the lateral resolution of nanostructures in bottom-up atom nanofabrication. In this paper we study the effects of the gallium atoms self-assembled on silicon surfaces (100) patterned with trenches at…

Materials Science · Physics 2009-11-10 B. Fazio , O. M. Marago' , E. Arimondo , C. Spinella , C. Bongiorno , G. D'Arrigo

Germanium (Ge), the next-in-line group-IV material, bears great potential to add functionality and performance to next-generation nanoelectronics and solid-state quantum transport based on silicon (Si) technology. Here, we investigate the…

The epitaxial growth of germanium on silicon leads to the self-assembly of SiGe nanocrystals via a process that allows the size, composition and position of the nanocrystals to be controlled. This level of control, combined with an inherent…

Mesoscale and Nanoscale Physics · Physics 2010-05-12 G. Katsaros , P. Spathis , M. Stoffel , F. Fournel , M. Mongillo , V. Bouchiat , F. Lefloch , A. Rastelli , O. G. Schmidt , S. De Franceschi

Formation of topological quantum phase on conventional semiconductor surface is of both scientific and technological interest. Here, we demonstrate epitaxial growth of 2D topological insulator, i.e. quantum spin Hall (QSH) state, on Si(111)…

Materials Science · Physics 2014-12-03 Miao Zhou , Wenmei Ming , Zheng Liu , Zhengfei Wang , Ping Li , Feng Liu

Physical vapor deposition of Si onto transferred graphene is investigated. At elevated temperatures, Si nucleates preferably on wrinkles and multilayer graphene islands. In some cases, however, Si can be quasi-selectively grown only on the…

Graphite surfaces interact weakly with molecules compared to other conducting surfaces bringing the molecule-molecule interaction to the foreground. C$_{60}$ on highly oriented pyrolytic graphite is a model system for studying the molecular…

Mesoscale and Nanoscale Physics · Physics 2019-11-25 E. Seydel , R. Hoffmann-Vogel , M. Marz

The deposition of one silicon monolayer on the silver (111) substrate in the temperature range 150-300$^\circ$C, gives rise to a mix of (4$\times$4), ($2\sqrt{3}\times 2\sqrt{3}$)R30$^\circ$ and ($\sqrt{13}\times\sqrt{13}$)R13.9$^\circ$…

Materials Science · Physics 2015-06-04 H. Jamgotchian , Y. Colignon , N. Hamzaoui , B. Ealet , J. Y. Hoarau , B. Aufray , J. P. Bibérian

Low temperature epitaxial breakdown of inhomogeneously strained Si capping layers is investigated. By growing Si films on coherently strained GeSi quantum dot surfaces, we differentiate effects of surface roughness, strain, and growth…

Materials Science · Physics 2015-05-28 Christopher W. Petz , Jerrold A. Floro

Self assembly on suitably chosen substrates is a well exploited root to control the structure and morphology, hence magnetization, of metal films. In particular, the Cu3Au(001) surface has been recently singled out as a good template to…

Materials Science · Physics 2009-11-07 A. Verdini , L. Floreano , F. Bruno , D. Cvetko , A. Morgante , F. Bisio , S. Terreni , M. Canepa

Using atomic resolved scanning tunneling microscopy, we present here the experimental evidence of a silicene sheet (graphene like structure) epitaxially grown on a close-packed silver surface (Ag(111)). This has been achieved via direct…

In this article, the results of investigation of processes occurring during the molecular-beam deposition of germanium layers on Si$_3$N$_4$ dielectric substrates within a wide range of the Ge film growth temperatures (30 to 600{\deg}C) are…

Multilayer structures on the basis of n-type (In,Fe)Sb and p-type (Ga,Fe)Sb diluted magnetic semiconductors (DMS) along with separate (In,Fe)Sb and (Ga,Fe)Sb layers were fabricated on GaAs substrates by pulsed laser sputtering of InSb,…

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