Related papers: Multi-Diagnostic Characterization of Laser-Produce…
We present the results of spectroscopic measurements in the extreme ultraviolet (EUV) regime (7-17 nm) of molten tin microdroplets illuminated by a high-intensity 3-J, 60-ns Nd:YAG laser pulse. The strong 13.5 nm emission from this…
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets by several-ns-long 2-$\mu$m-wavelength laser pulses, are studied in the extreme ultraviolet (EUV) regime. In a two-pulse scheme, a pre-pulse…
Experimental spectroscopic studies are presented, in a 5.5--25.5nm extreme-ultraviolet (EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin microdroplets by 5-ns-pulsed, 2-$\mu$m-wavelength laser…
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation…
We present optical Thomson scattering measurements of electron density and temperature in a large-scale (~2 cm) exploding laser plasma produced by irradiating a solid target with a high energy (5-10 J) laser pulse at high repetition rate (1…
We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the $\lambda_{\mathrm{laser}} = 1.064 - 10.6 $ $\mu$m range. Detailed numerical simulations of laser-irradiated spherical tin…
The extreme ultraviolet (XUV) emission from dense plasmas generated with sub-10-fs laser pulses with varying peak intensities up to 3*10^16 W/cm^2 is investigated for different target materials. K shell spectra are obtained from low Z…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and…
We propose a collective Thomson scattering experiment at the VUV free electron laser facility at DESY (FLASH) which aims to diagnose warm dense matter at near-solid density. The plasma region of interest marks the transition from an ideal…
We present the first two-dimensional (2D) optical Thomson scattering measurements of electron density and temperature in laser-produced plasmas. The novel instrument directly measures $n_e(x,y)$ and $T_e(x,y)$ in two dimensions over large…
We report the first direct demonstration of possibility to generate the extreme ultraviolet (EUV) radiation with a freely expanding jet of dense plasma with multiply-charged ions supported by high-power microwaves. The detected emission…
We discuss a concept of a point-like source of the extreme ultraviolet (EUV) light based on a non-equilibrium microwave discharge in expanding jet of dense xenon plasma with multiply charged ions. A conversion efficiency of microwave…
We have developed a non-collective Thomson scattering diagnostic for measurements of electron density and temperature on the Large Plasma Device. A triple grating spectrometer with a tunable notch filter is used to discriminate the faint…
We report on the generation of a narrow divergence ($\theta\approx 2.5$ mrad), multi-MeV ($E_\text{MAX} = 18$ MeV) and ultra-high brilliance ($\approx 2\times10^{19}$ photons s$^{-1}$ mm$^{-2}$ mrad $^{-2}$ 0.1\% BW) $\gamma$-ray beam from…
Collective X-ray Thomson scattering has become a versatile tool for the diagnostics of dense plasmas. Assuming homogeneous density and temperature throughout the target sample, these parameters can be determined directly from the plasmon…
The next generation of lithography machines uses extreme ultraviolet (EUV) light originating from laser-produced plasma (LPP) sources, where a small tin droplet is ionized by an intense laser pulse to emit the requested light at 13.5 nm.…
We measured for the first time the electron density in an Extreme Ultra-Violet induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density…
We present experimental measurements of a pulsed plasma gun, using two-colour imaging laser interferometry and spatially resolved Thomson scattering. Interferometry measurements give an electron density $n_e\approx2.7\times10^{17}$…
The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impact on the highly delicate mirrors It is essential to…
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces such as sensors, fiducials and interferometer mirrors…