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Two-dimensional (2D) semiconductors have been suggested both for ultimately-scaled field-effect transistors (FETs) and More-than-Moore nanoelectronics. However, these targets can not be reached without accompanying gate insulators which are…

Resistive switching devices herald a transformative technology for memory and computation, offering considerable advantages in performance and energy efficiency. Here we employ a simple and scalable material system of conductive oxide…

Applied Physics · Physics 2025-03-27 Yang Li , Wei Wang , Di Zhang , Maria Baskin , Aiping Chen , Shahar Kvatinsky , Eilam Yalon , Lior Kornblum

Since the 1960's when Gordon Moore proposed that the transistor density in our electronic devices should double every two years while the cost is halved, the semiconductor industry has taken this statement to heart. Over the last few…

Materials Science · Physics 2022-07-27 Aditya Muralidharan

Making ultra-short gate-length transistors significantly contributes to scaling the contacted gate pitch. This, in turn, plays a vital role in achieving smaller standard logic cells for enhanced logic density scaling. As we push the…

Mesoscale and Nanoscale Physics · Physics 2024-12-17 Keshari Nandan , Ateeb Naseer , Amit Agarwal , Somnath Bhowmick , Yogesh S. Chauhan

A device and process strategy for achieving reliable indium gallium zinc oxide and indium oxide transistors compatible with a 400oC BEOL thermal budget and without performance degradation is demonstrated by fully exploiting intrinsic oxide…

Thanks to their unique properties single-layer 2-D materials appear as excellent candidates to extend Moore's scaling law beyond the currently manufactured silicon FinFETs. However, the known 2-D semiconducting components, essentially…

Mesoscale and Nanoscale Physics · Physics 2020-06-30 Cedric Klinkert , Áron Szabó , Christian Stieger , Davide Campi , Nicola Marzari , Mathieu Luisier

Van der Waals heterostructure based on layered two-dimensional (2D) materials offers unprecedented opportunities to create materials with atomic precision by design. By combining superior properties of each component, such heterostructure…

Two-dimensional van der Waals semiconductors are promising for future nanoelectronics. However, integrating high-k gate dielectrics for device applications is challenging as the inert van der Waals material surfaces hinder uniform…

Two-dimensional (2D) semiconductors offer a promising prospect for high-performance and energy-efficient devices especially in the sub-10 nm regime. Inspired by the successful fabrication of 2D $\beta$-TeO$_2$ and the high on/off ratio and…

Mesoscale and Nanoscale Physics · Physics 2022-02-17 Shiying Guo , Hengze Qu , Wenhan Zhou , Shengyuan A. Yang , Yee Sin Ang , Jing Lu , Haibo Zeng , Shengli Zhang

Two-dimensional (2D) materials like transition metal dichalcogenides (TMD) have proved to be serious candidates to replace silicon in several technologies with enhanced performances. In this respect, the two remaining challenges are the…

Two-dimensional (2D) semiconductors are widely recognized as attractive channel materials for low-power electronics. However, an unresolved challenge is the integration of high-quality, ultrathin high-\k{appa} dielectrics that fully meet…

As the continuing down-scaling of field-effect transistors (FETs) in more-than-Moore integrated circuits, finding new functional two-dimensional (2D) materials with a higher dielectric constant (high-k) serve as gate dielectrics is…

Materials Science · Physics 2022-12-06 Yue Hu , Jingwen Jiang , Peng Zhang , Fuxin Guan , Da Li , Zhengfang Qian , Pu Huang , Xiuwen Zhang

As silicon transistors scale toward future technology nodes, three-dimensional architectures -- including gate-all-around (GAA) nanoribbon and complementary field-effect transistors (CFETs) -- require channel widths in the tens of…

Transistor miniaturization requires controlling gate leakage through ultrathin dielectrics and minimizing source/drain contact resistance. Although two-dimensional (2D) semiconductors offer excellent electrostatic control, their interfaces…

Mesoscale and Nanoscale Physics · Physics 2026-04-24 Mahdi Pourfath , Tibor Grasser

Two-dimensional (2D) topological insulators (TIs), a new state of quantum matter, are promising for achieving the low-power-consuming electronic devices owning to the remarkable robustness of their conducting edge states against…

Materials Science · Physics 2016-11-15 Yandong Ma , Liangzhi Kou , Ying Dai , Thomas Heine

As a newly identified single-crystalline van der Waals dielectric with a high dielectric constant, Bi2SeO5 plays a pivotal role in advancing 2D electronic devices. In this work, we systematically investigate the defect properties of Bi2SeO5…

Materials Science · Physics 2025-12-02 Chen-Min Dai , Feifan Bian , Yafeng Zhang , Jiaqi Chen , Zenghua Cai , Menglin Huang , Chunlan Ma

Low power consumption in both static and dynamic modes of operation is a key requirement in modern, highly scaled nanoelectronics. Tunneling field-effect transistors (TFETs) that exploit direct band-to-band tunneling of charges and exhibit…

2D materials hold transformative promise for next-generation nanoelectronics. However, successfully integrating these materials from laboratory-scale discoveries into real-world devices depends on precisely controlling their properties,…

Bi2O2Se is an emerging semiconducting, air-stable layered material (Nat. Nanotechnol. 2017, 12, 530; Nano Lett. 2017, 17, 3021), potentially exceeding MoS2 and phosphorene in electron mobility and rivalling typical Van der Waals stacked…

Materials Science · Physics 2021-09-14 Huanglong Li , Xintong Xu , Yi Zhang , Roland Gillen , Luping Shi , John Robertson

Semiconductor Bi$_2$O$_2$Se nanolayers of high crystal quality have been realized via epitaxial growth. These two-dimensional (2D) materials possess excellent electron transport properties with potential application in nanoelectronics. It…

Mesoscale and Nanoscale Physics · Physics 2018-02-12 Mengmeng Meng , Shaoyun Huang , Congwei Tan , Jinxiong Wu , Yumei Jing , Hailin Peng , H. Q. Xu
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