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Related papers: PBr3 Adsorption and Dissociation on the Si(100) Su…

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For the most precise incorporation of single impurities in silicon, which is utilized to create quantum devices, a monolayer of adatoms on the Si(100) surface and a dopant-containing molecule are used. Here we studied the interaction of a…

Materials Science · Physics 2023-11-30 T. V. Pavlova , V. M. Shevlyuga

Phosphorus diffusion on a Si(100) surface was studied using scanning tunneling microscopy (STM) at temperatures of 77 and 300 K. The phosphorus source utilized was the PBr$_3$ molecule, which fully dissociates on the surface at 77 K. We…

Materials Science · Physics 2025-10-20 T. V. Pavlova , V. M. Shevlyuga

This paper presents a DFT study for phosphine adsorption on a Si(001)-2$\times$1 surface covered by a chlorine monolayer, including adsorption on local defects, i.e. mono- and bivacancies in the adsorbate layer (Cl, Cl$_2$), and combined…

Materials Science · Physics 2019-01-04 Tatiana V. Pavlova , Georgy M. Zhidomirov , Konstantin N. Eltsov

The interaction of the PBr3 molecule with Si dangling bonds (DBs) on a chlorinated Si(100) surface was studied. The DBs were charged in a scanning tunneling microscope (STM) and then exposed to PBr3 directly in the STM chamber. Uncharged…

Materials Science · Physics 2024-08-28 T. V. Pavlova , V. M. Shevlyuga

BCl$_3$ is a promising candidate for atomic-precision acceptor doping in Si, but optimizing the electrical properties of structures created with this technique requires a detailed understanding of adsorption and dissociation pathways for…

We use scanning tunneling microscopy (STM) and Auger electron spectroscopy to study the behavior of adsorbed phosphine (PH$_{3}$) on Si(001), as a function of annealing temperature, paying particular attention to the formation of the Si-P…

Materials Science · Physics 2007-05-23 N. J. Curson , S. R. Schofield , M. Y. Simmons , L. Oberbeck , J. L. O'Brien , R. G. Clark

We used DFT to study the energetics of the decomposition of alane, AlH3, on the Si(001) surface, as the acceptor complement to PH3. Alane forms a dative bond with the raised atoms of silicon surface dimers, via the Si atom lone pair. We…

Materials Science · Physics 2017-09-13 Richard L. Smith , David R. Bowler

One of the most promising acceptor precursors for atomic-precision $\delta$-doping of silicon is BCl$_3$. The chemical pathway, and the resulting kinetics, through which BCl$_3$ adsorbs and dissociates on silicon, however, has only been…

Materials Science · Physics 2025-05-14 Quinn T. Campbell , Shashank Misra , Jeffrey A. Ivie

In this work, we studied the adsorption behavior of deposited Si atoms along with their diffusion and other dynamic processes on a Pb monolayer-covered Si(111) surface from 125-230 K using a variable-temperature scanning tunneling…

Mesoscale and Nanoscale Physics · Physics 2017-06-28 Rakesh Kumar , Chuang-Kai Fang , Chih-Hao Lee , Ing-Shouh Hwang

We have studied diffusion pathways of a silyl radical adsorbed on the hydrogenated Si (100)-(2x1) surface by density-functional theory. The process is of interest for the growth of crystalline silicon by plasma-enhanced chemical vapor…

Materials Science · Physics 2008-03-31 Michele Ceriotti , Marco Bernasconi

In order to fabricate precise atomic-scale devices in silicon using a combination of scanning tunnelling microscopy (STM) and molecular beam epitaxy it is necessary to minimize the segregation/diffusion of dopant atoms during silicon…

The precise incorporation of a phosphorus atom into a silicon surface is essential for the fabrication of nanoelectronic devices in which the active area is formed from single impurities. The most accurate approach employs scanning…

Materials Science · Physics 2025-10-20 T. V. Pavlova

The adsorption of AlCl$_{3}$ on Si(100) and the effect of annealing the AlCl$_{3}$-dosed substrate was studied to reveal key surface processes for the development of atomic-precision acceptor-doping techniques. This investigation was…

Diborane (B$_2$H$_6$) is a promising molecular precursor for atomic precision p-type doping of silicon that has recently been experimentally demonstrated [T. {\v{S}}kere{\v{n}}, \textit{et al.,} Nature Electronics (2020)]. We use density…

The incorporation of phosphorus in silicon is studied by analyzing phosphorus delta-doped layers using a combination of scanning tunneling microscopy, secondary ion mass spectrometry and Hall effect measurements. The samples are prepared by…

Condensed Matter · Physics 2009-11-07 L. Oberbeck , N. J. Curson , M. Y. Simmons , R. Brenner , A. R. Hamilton , S. R. Schofield , R. G. Clark

The adsorption of two kinds of porphyrin (Cu-TBPP) and perylene (PTCDA) derived organic molecules deposited on KBr and Al2O3 surfaces has been studied by non-contact force microscopy in ultra-high vacuum, our goal being the assembly of…

Recent experiments on the silicon terminated $3\times 2$ SiC(100) surface indicated an unexpected metallic character upon hydrogen adsorption. This effect was attributed to the bonding of hydrogen to a row of Si atoms and to the…

Materials Science · Physics 2009-11-11 R. Di Felice , C. M. Bertoni , C. A. Pignedoli , A. Catellani

We have investigated Rb adsorption on the Si(100) surface for 0.5 and 1 monolayer coverages using the total energy method with norm-conserving pseudopotentials. For 2$\times$1 reconstruction at 1 ML coverage symmetrized dimers are found to…

Strongly Correlated Electrons · Physics 2007-05-23 E. Mete , R. Shaltaf , Ş. Ellialtıoğlu

The structures and energetics of organic molecules adsorbed onto clean and H-passivated Si(001)-(2$\times$1) surfaces have been calculated using density functional theory. For benzene adsorbed on the clean Si surface the tight-bridge…

Materials Science · Physics 2009-11-13 Karen Johnston , Risto M. Nieminen

We demonstrate the controlled incorporation of P dopant atoms in Si (001) presenting a new path toward the creation of atomic-scale electronic devices. We present a detailed study of the interaction of PH3 with Si (001) and show that it is…

Materials Science · Physics 2009-11-10 S. R. Schofield , N. J. Curson , M. Y. Simmons , F. J. Ruess , T. Hallam , L. Oberbeck , R. G. Clark
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