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Aims: We derive limits on the EBL density from the energy spectra of distant sources of very high energetic gamma-rays (VHE gamma-rays). Methods: VHE gamma-rays are attenuated by the photons of the EBL via pair production, which leaves an…
Grayscale lithography allows the creation of micrometer-scale features with spatially-controlled height in a process that is fully compatible with standard lithography. Here, solid immersion lenses are demonstrated in silicon carbide using…
The present day spectrum of the extragalactic background light (EBL) in UV, optical and IR wavelengths is the integral result of multiple astrophysical processes going on throughout the evolution of the Universe. The relevant processes…
A process for growing gallium nitride (GaN) vertical p-i-n homojunctions on (111) silicon (Si) substrates using metalorganic chemical vapor deposition (MOCVD) was developed, and a triple mesa etch technique was used to fabricate efficient…
The preparation of neutron-optical phase gratings with light-optical holography is reviewed. We compare the relevant concepts of i) Kogelnik's theory for Bragg diffraction of light by thick volume gratings, which can be used to analyze…
Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios. Application of nanostructures like diffractive X-ray…
Developing a suitable production method for three-dimensional periodic nanostructures with high aspect ratios is a subject of growing interest. For mass production, Talbot lithography offers many advantages. However, one disadvantage is…
Ultrafast lasers have revolutionized material processing, opening a wealth of new applications in many areas of science. A recent technology that allows the cleaving of transparent materials via non-ablative processes is based on focusing…
Precise manipulation of high brightness electron beams requires detailed knowledge of the particle phase space shape and evolution. As ultrafast electron pulses become brighter, new operational regimes become accessible with emittance…
Fabrication of nanoscale optical Fiber Bragg Gratings (FBGs) is one of the key manufacturing processes for fiber optics, which has many important applications in data communication and distributed remote sensing at a distance up to hundreds…
A model for a new electron vortex beam production method is proposed and experimentally demonstrated. The technique calls on the controlled manipulation of the degrees of freedom of the lens aberrations to achieve a helical phase front.…
In this work, we use two different methods to determine the opacity of the TeV gamma-rays caused by the extragalactic background light (EBL) via e-e+ production due to photon-photon interaction. The first method, Model-Dependent Approach,…
Actuation of thin polymeric films via electron irradiation is a promising avenue to realize devices based on strain engineered two dimensional (2D) materials. Complex strain profiles demand a deep understanding of the mechanics of the…
We report a systematic treatment of the holographic generation of electron Bessel beams, with a view to applications in electron microscopy. We describe in detail the theory underlying hologram patterning, as well as the actual…
High-resolution spectroscopy (R>50,000) in astronomy typically uses echelle-type spectrographs, which excel for exoplanet detection via radial velocity but compromise throughput for atmospheric characterization. We propose and test a novel…
One highly desirable function of a diffraction grating is its ability to deflect incident light into a specific diffraction order with near-perfect efficiency. While such asymmetry can be achieved in a variety of ways, e.g., by using a…
This paper summarizes the state of the art of photocathode based on III-V semiconductors for spin polarized electron beam production. The limitations preventing this class of material to provide the long term reliability at the highest…
The epitaxial growth of complex oxides enables the production of high-quality films, yet substrate choice is restricted to certain symmetry and lattice parameters, thereby limiting the technological applications of epitaxial oxides. In…
The extragalactic background light (EBL), from ultraviolet to infrared wavelengths, is predominantly due to emission from stars, accreting black holes and reprocessed light due to Galactic dust. The EBL can be studied through the imprint it…
Thermal scanning probe lithography offers high resolution and versatility, making it a promising alternative for fabricating photonic devices. Here, we introduce a new method that expands its applications by enabling direct fabrication of…