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Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may…
Low voltage scanning electron microscopy is a powerful tool for examining surface features and imaging beam sensitive materials. Improving resolution during low voltage imaging is then an important area of development. Decreasing the effect…
The rise of micro/nanooptics and lab-on-chip devices demands the fabrication of three-dimensional structures with decent resolution. Here, we demonstrate the combination of grayscale electron beam lithography and direct forming methodology…
Modern grating manufacturing techniques suffer from inherent issues that limit their peak efficiencies. The anisotropic etching of silicon facilitates the creation of custom gratings that have sharp and atomically smooth facets, directly…
Pulsed-laser dry printing of noble-metal microrings with a tunable internal porous structure, which can be revealed via an ion-beam etching post-procedure, was demonstrated. Abundance and average size of the pores inside the microrings were…
Interfering deep ultraviolet (DUV) lasers can induce substantial density modulations in an ozone-doped gas flow via photochemical reactions, creating volume diffraction gratings. These transient optics are immune to target debris and…
A topology optimization method is presented and applied to a blazed diffraction grating in reflection under conical incidence. This type of gratings is meant to disperse the incident light on one particular diffraction order and this…
Novel schemes for generating ultra-low emittance electron beams have been developed in the last years and promise compact particle sources with excellent beam quality suitable for future high-energy physics experiments and free-electron…
We demonstrate first- and second-order spatial differentiation of an optical beam transverse profile using thin suspended subwavelength gratings. Highly reflective one-dimensional gratings are patterned on suspended 200 nm-thick silicon…
Immersed reflection gratings improve spectral resolving power by enabling diffraction within a high refractive index medium. This principle has been widely adopted to make grating spectrometers more compact. Conventional immersed gratings…
We report on the development of some process capabilities for a polymer-based, multi-layer microelectrofluidic platform, namely: the hot embossing process, metallization on polymer and polymer bonding. Hot embossing experiments were…
In this chapter, we demonstrate a general formulation of the Finite Element Method allowing to calculate the diffraction efficiencies from the electromagnetic field diffracted by arbitrarily shaped gratings embedded in a multilayered stack…
Optical bottle beams can be used to trap atoms and small low-index particles. We introduce a figure of merit for optical bottle beams, specifically in the context of optical traps, and use it to compare optical bottle-beam traps obtained by…
The very high energy (VHE) $\gamma$-ray spectra of some TeV Blazars, after being corrected for absorption in the extragalactic background light (EBL), appear unusually hard, which poses challenges to conventional acceleration and emission…
The extragalactic background light (EBL) is the second-most-intense form of cosmic background light (the first being the cosmic microwave background) and contains the redshifted optical radiation, from infra-red to ultraviolet, emitted…
We demonstrate the fabrication of millimeter-sized optical components using tomographic volumetric additive manufacturing (VAM). By purposely blurring the writing beams through the use of a large etendue source, the layer-like artifacts…
One of the important advantages of optical metasurfaces over conventional diffractive optical elements is their capability to efficiently deflect light by large angles. However, metasurfaces are conventionally designed using approaches that…
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its…
The direct measurement of the extragalactic background light (EBL) is difficult at optical to infrared wavelengths because of the strong foreground radiation originating in the Solar System. Very high energy (VHE, E$>$100 GeV) gamma rays…
High quality electron beams, with high spatial and tempo- ral resolution, have an important use in electron diffraction experiments to probe and study the constituents of matter. A cold electron source is being developed based on elec- tron…