Related papers: High-quality Blazed Gratings through Synergy betwe…
We report on the effect of ambient gas on the contrast and the resolution of electron beam lithography (EBL) in gaseous environments on insulating substrates. Poly(methyl methacrylate) (PMMA) films were exposed in an environmental scanning…
Standard multiple-beam holography has been largely used to produce gratings in polymer-liquid crystal composites, like POLICRYPS, H-PDLC gratings and POLIPHEM [1]. In this work we present a different approach to liquid crystalpolymeric…
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character projection (CP) technique, where some complex shapes…
We report a method for fabricating nanogaps directly with electron beam lithography (EBL). The primary resolution-limit of EBL, electron back-scattering, is reduced dramatically by using a thin-film as a substrate. We show that this…
Measuring the diffuse, highly-ionized baryonic content in galactic halos and the intergalactic medium through soft x-ray absorption spectroscopy of active galactic nuclei is a main scientific objective of the Lynx X-ray Observatory mission…
Subwavelength grating micro-polarizer arrays, as a type of focal plane division simultaneous detection method, are significantly advancing the development and practical application of polarization imaging technology. Based on the…
Future NASA X-ray spectroscopy missions will require high throughput, high resolution grating spectrometers. Off-plane reflection gratings are capable of meeting the performance requirements needed to realize the scientific goals of these…
Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au…
Materials to be deployed in space applications have to undergo a variety of different test scenarios, simulating actual space conditions. Among these materials solar photovoltaic cells, optics, meta-materials and more will be directly…
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, recently the traditional EBL system is extended into MCC system. %to further improve the…
In this report, certain claims regarding the design criteria and characterizations of plasmonic bullseye (BE) structures are investigated. Does the matching of the grating's periodicity to the wavelength of surface waves results in a strong…
Granular nanostructure of electron beam resist had limited the ultimate resolution of electron beam lithography. We report a thermal process to achieve a uniform and homogeneous amorphous thin film of poly methyl methacrylate electron…
We describe here a method to generate high-definition arbitrary laser beam shapes and profiles useful to many applications, ranging from optical patterning and lithography to optical trapping of microscopic particles and ultracold atoms.…
Recent observations of blazars at high energy (HE, 0.1-100 GeV) and very high energy (VHE, >0.1 TeV) have provided important constraints on the intensity and spectrum of the diffuse Extragalactic Background Light (EBL), shedding light on…
Lamellar gratings are widely used diffractive optical elements; gratings etched into Si can be used as structural elements or prototypes of structural elements in integrated electronic circuits. For the control of the lithographic…
The extragalactic background light (EBL) in the IR to UV bands partly absorbs very high energy (VHE, $E \geq$ 100GeV) $\gamma-$ray photons travelling over cosmological distances via pair production. In this paper, to get stronger…
We present a technique to fabricate ultrathin (down to 20 nm) uniform electron transparent windows at dedicated locations in a SiN membrane for in situ transmission electron microscopy experiments. An electron-beam (e-beam) resist is…
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development of the next generation high-numerical aperture (high-NA)…
Context. Measurements of the Extragalactic Background Light (EBL) are a fundamental source of information on the collective emission of cosmic sources. Aims. At infrared wavelengths, however, these measurements are precluded by the…
Diffractive optical elements such as periodic gratings are fundamental devices in X-ray imaging - a technique that medical, material science and security scans rely upon. Fabrication of such structures with high aspect ratios at the…