Related papers: Phase mask fabrication for multi-plane light conve…
Multi-plane light converters (MPLCs) are an emerging 3D beam shaping technology capable of deterministically mapping a basis of input spatial light modes to a new basis of output modes. The ability to perform such spatial reformatting…
Multifocal laser direct writing (LDW) based on phase-only spatial light modulator (SLM) can realize flexible and parallel nanofabrication with high throughput potential. In this investigation, a novel approach of combining two-photon…
Grayscale lithography allows the creation of micrometer-scale features with spatially-controlled height in a process that is fully compatible with standard lithography. Here, solid immersion lenses are demonstrated in silicon carbide using…
Direct-write multi-photon laser lithography (MPL) combines highest resolution on the nanoscale with essentially unlimited 3D design freedom. Over the previous years, the groundbreaking potential of this technique has been demonstrated in…
Multi-plane light conversion (MPLC) has recently been developed as a versatile tool for manipulating spatial distributions of the optical field through repeated phase modulations. An MPLC Device consists of a series of phase masks separated…
We present a maskless microscope projection lithography system (MPLS), in which photomasks have been replaced by a Digital Micromirror Device type spatial light modulator (DMD, Texas Instruments). Employing video projector technology high…
Microscale 3D printing technologies have been of increasing interest in industry and research for several years. Unfortunately, the fabricated structures always deviate from the respective expectations, often caused by the physico-chemical…
As the feature size of integrated circuits continues to decrease, optical proximity correction (OPC) has emerged as a crucial resolution enhancement technology for ensuring high printability in the lithography process. Recently, level…
Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography defined…
Multilayer metasurfaces provide substantially greater spectral design freedom than single-layer devices, yet their implementation in the visible and near-infrared remains limited by the complexity, cost, and low throughput of conventional…
The rise of micro/nanooptics and lab-on-chip devices demands the fabrication of three-dimensional structures with decent resolution. Here, we demonstrate the combination of grayscale electron beam lithography and direct forming methodology…
The height of dielectric metasurfaces is largely considered a constant in the fabrication process due to the top-down fabrication approach, resulting in a binary structure. Yet, for the recently introduced Mie voids metasurfaces,…
Micro/nano electro-mechanical systems (MEMS/NEMS) are constantly attracting an increasing attention for their relevant technological applications in fields ranging from biology, medicine, ecology, energy to industry. Most of the…
We propose to use femtosecond direct laser writing technique to realize dielectric optical elements from photo-resist materials for the generation of structured light from purely geometrical phase transformations. This is illustrated by the…
We present here our recent progress in the three-dimensional (3D) direct laser writing (DLW) of step-index core waveguides inside diverse technologically relevant dielectric substrates, with specific emphasis on the demonstration of DLW…
Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of free-form curvilinear mask shapes that enhance printed wafer…
Volumetric lithography offers a path to scalable fabrication of complex three-dimensional (3D) micro- and nanoscale architectures, yet existing approaches are limited by quasi-two-dimensional exposure physics or slow serial writing. We…
In optical imaging, achieving high resolution often comes at the expense of a shallow depth of field. This means that when using a standard microscope, any minor movement of the object along the optical axis can cause the image to become…
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of next-generation lithography technology. As the feature size…
A simple and effective method to fabricate a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling a printing gap…