Related papers: Cavity-based compact light source for extreme ultr…
Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (LEEs) produced upon illumination of resist materials with…
Bright sources of high-energy X-rays and electrons are indispensable tools in advanced imaging. Yet, current laser-driven systems typically support only single-modality imaging, require complex infrastructure, or operate at low repetition…
Various scientific and industrial researches such as spectroscopy and advanced nano-technologies have been demanding high flux and fully coherent EUV and X-ray radiation. These demands can be commendably satisfied with a MHz-level…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and…
The new generation of laser facilities is expected to deliver short (10 fs - 100 fs) laser pulses with 10 - 100 PW of peak power. This opens an opportunity to study matter at extreme intensities in the laboratory and provides access to new…
We present recent results on high-power guiding and laser wakefield acceleration (LWFA) in the ELBA beamline at ELI Beamlines, using the L3-HAPLS laser system (13 J, 30 fs, 0.2 Hz). By employing self-waveguiding in a 20 cm plasma channel in…
We report experimental results of vacuum ultraviolet (VUV) emission from the plasma of an electron cyclotron resonance (ECR) discharge in hydrogen, sustained by powerful millimeter-wavelength radiation of a gyrotron. Distinctive features of…
Scaling femtosecond terahertz (THz) and ultraviolet (UV) sources to high repetition rates is essential for high-throughput ultrafast spectroscopy and imaging applications. Yet, their efficient generation at high average power remains…
We demonstrate a versatile technique for generating continuously wavelength-tunable laser waveforms, with mJ pulse energies and ultrashort pulse durations down to few-cycle in the ultraviolet C and visible spectral ranges. Using the…
We propose a photon-recycling dielectric laser accelerator (DLA) system based on silicon photonic device. Our DLA system employs guided electromagnetic waves as a primary energy source, modulated to inject into the electron-light…
Light-matter interactions in the deep ultraviolet (DUV) wavelength region exhibits a variety of optical effects such as luminescence, photoisomerization, and polymerization in many materials. Despite the rich photochemistry and high spatial…
Laser-plasma accelerators have become compact sources of ultrashort electron bunches at energies up to the gigaelectronvolt range thanks to the remarkable progress made over the past decade. A direct application of these electron bunches is…
We adapted a conventional microscope for projection photolithography using an ultraviolet (UV) light-emitting diode (LED) as a light source. The use of a UV LED provides the microscope projector with several advantages in terms of…
Extreme ultraviolet (EUV) lithography has revolutionized high-volume manufacturing of nanoscale components, enabling the production of smaller, denser, and more energy efficient integrated circuit devices. Yet, the use of EUV light results…
Compact acceleration of a tightly collimated relativistic electron beam with high charge from a laser-plasma interaction has many unique applications. However, currently the well-known schemes, including laser wakefield acceleration from…
THz radiation promises breakthrough advances in compact advanced accelerators due to the high frequency and GV/m fields achievable, orders of magnitude larger than in conventional radiofrequency (RF) based accelerators. Compared to…
The ultrafast and ultracold electron source, based on near-threshold photoionisation of a laser-cooled and trapped atomic gas, offers a unique combination of low transverse beam emittance and high bunch charge. Its use is however still…
Erbium-doped fiber lasers exhibit high coherence and low noise as required for applications in fiber optic sensing, gyroscopes, LiDAR, and optical frequency metrology. Endowing Erbium-based gain in photonic integrated circuits can provide a…
Recent progress in short wavelength free-electron lasers extending from the extreme ultraviolet through the x-ray regime have opened new avenues for industrial and research applications. A high-gain/low-Q oscillator, i.e., a regenerative…
As an alternative to Compton backscattering and bremsstrahlung, the process of colliding high-energy electron beams with strong laser fields can more efficiently provide both cleaner and brighter source of photons in the multi-GeV range for…