Related papers: Cavity-based compact light source for extreme ultr…
The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 nm or 11.3…
We discuss a concept of a point-like source of the extreme ultraviolet (EUV) light based on a non-equilibrium microwave discharge in expanding jet of dense xenon plasma with multiply charged ions. A conversion efficiency of microwave…
Extreme ultraviolet (XUV) lasers are essential for the investigation of fundamental physics. Especially high repetition rate, high photon flux sources are of major interest for reducing acquisition times and improving signal to noise ratios…
Extreme ultraviolet (EUV) coherent sources below 120nm are of paramount significance for promoting next-generation nano-scale lithography,precision spectroscopy, and exploring the emerging physical phenomena in quantum materials. Nonlinear…
We have developed and demonstrated a versatile, compact electron source that can produce a monoenergetic electron beam up to 50 mm diameter from 0.1 to 30 keV with an energy spread of <10 eV. By illuminating a metal cathode plate with a…
Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials, or correlated solids, and enable advanced applications in imaging or…
A compact damping ring with limited circumference of about 160 m is proposed for producing kilowatt-level coherent EUV radiation. The electron bunch in the ring is modulated by a 257nm wavelength laser with the help of the angular…
Energy recovery linac (ERL) holds great promise for generating high repetition-rate and high brightness electron beams. The application of ERL to drive a free-electron laser is currently limited by its low peak current. In this paper, we…
The next generation of lithography machines uses extreme ultraviolet (EUV) light originating from laser-produced plasma (LPP) sources, where a small tin droplet is ionized by an intense laser pulse to emit the requested light at 13.5 nm.…
This paper discusses a simple, low-cost, highly efficient two-mirror projector with a simplified illumination system. The EUV source power can be reduced by 1/10 compared to the current six-mirror EUV projector system. The required EUV…
To generate laser with short wavelength is a bottle-neck problem in laser technology. The extreme ultraviolet (EUV) lasers are usually produced with low efficiency by nonlinear multi-photon process. Here we show the generation of 58.4 nm…
Combination of advanced high power laser technology, new acceleration methods and achievements in undulator development opens a way to build compact, high brilliance Free Electron Laser (FEL) driven by a laser wakefield accelerator (LWFA).…
High-intensity laser pulses covering the ultraviolet to terahertz spectral regions are nowadays routinely generated in a large number of laboratories. In contrast, intense extreme-ultraviolet (XUV) pulses have only been demonstrated using a…
We report here the results of a one week long investigation into the conceptual design of an X-ray source based on a compact ring with on-orbit and on-energy laser-plasma accelerator. We performed these studies during the June 2016 USPAS…
Deep ultraviolet (DUV) laser pulses with tuneable wavelength and very short duration are a key enabling technology for next-generation technology and ultrafast science. Their generation has been the subject of extensive experimental effort,…
We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the $\lambda_{\mathrm{laser}} = 1.064 - 10.6 $ $\mu$m range. Detailed numerical simulations of laser-irradiated spherical tin…
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces such as sensors, fiducials and interferometer mirrors…
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflective projection optics makes it inaccessible for small-scale…
We convert a GeV laser-plasma electron accelerator into a compact femtosecond-pulsed $\gamma$-ray source by inserting a $100 \mu$m-thick glass plate $\sim3$ cm after the accelerator exit. With near-unity reliability, and requiring only…
One aim of upcoming high-intensity laser facilities is to provide new high-flux gamma-ray sources. Electromagnetic cascades may serve for this, but are known to limit both field strengths and particle energies, restricting efficient…