Related papers: EUV Debris Mitigation using Magnetic Nulls
Eu(TTA)3 complexes are used as an emission source in the presence of high refractive index dielectric nanostructures. These nanostructures support Mie-type resonances that modify the local density of optical states. Specifically, the…
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the…
To avoid reflectivity losses in ITER optical diagnostic systems, plasma sputtering of metallic First Mirrors is foreseen in order to remove deposits coming from the main wall (mainly beryllium and tungsten). Therefore plasma cleaning has to…
We report optical absorption imaging of ultracold neutral plasmas.Images are used to measure the ion absorption spectrum, which is Doppler-broadened. Through the spectral width, we monitor ion equilibration in the first 250ns after plasma…
Electron beam induced deposition (EBID) currently provides the only direct writing technique for truly three-dimensional nanostructures with geometrical features below 50 nm. Unfortunately, the depositions from metal-organic precursors…
We discuss an experimental technique aimed at tagging electron neutrinos in multi-GeV artificial sources on an event-by-event basis. It exploits in a novel manner calorimetric and tracking technologies developed in the framework of the LHC…
Electrostatic charge dissipation is one of the major concerns for satellites operating in the Earth's orbits. Under energetic plasma conditions, they may acquire very high negative potential (up to 10's of kV) due to the collection of…
Recently, there have been proposals that the classic Euler-Heisenberg Lagrangian together with duality could be employed to set limits on magnetic monopoles having masses less than 1 TeV. The D0 collaboration at Fermilab has used such a…
We propose a novel ion trap design with the high collection efficiency parabolic-mirror integrated with the ion trap electrodes. This design has three radio frequency (RF) electrodes and eight direct current(DC) compensation electrodes. By…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
The centrifugal mirror confinement scheme incorporates supersonic rotation into a magnetic mirror device, which stabilizes and heats the plasma. This concept is under investigation in the Centrifugal Mirror Fusion Experiment (CMFX) at the…
The concept of metasurfaces was recently applied to the extreme ultraviolet (EUV) spectral regime, providing a new opportunity for transmissive focusing elements in a regime where materials are highly lossy. The realization of metalenses in…
Creating magnetized relativistic pair plasma in the laboratory would enable the exploration of unique plasma physics relevant to some of the most energetic events in the universe. As a step towards a laboratory pair plasma, we have…
Periodic or gradient subwavelength structures are basic configurations of photonic crystals and metamaterials. While the numerical simulations predict trivial loss, but the fabricated photonic crystal waveguides by E-beam lithography and…
A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facilitate accurate simulations of EUV mask performance for…
The possibility to use surface plasmon polaritons for enhancement of weak magnetic dipole transitions is analyzed theoretically and demonstrated experimentally for simple flat geometry and sine-wave profile modulated plasmonic films.…
We present experimental results of vacuum laser acceleration (VLA) of electrons using radially polarized laser pulses interacting with a plasma mirror. Tightly focused radially polarized laser pulses have been proposed for electron…
The ion backflow is the main limiting factor for operating time projection chambers at high event rates. A significant effort is invested by many experimental groups to solve this problem. This paper explores a solution based on operating a…
Trapped ions in micro-cavities constitute a key platform for advancing quantum information processing and quantum networking. By providing an efficient light-matter interface within a compact architecture, they serve as highly efficient…
Deep ultraviolet (DUV) light sources are used to neutralise isolated test masses in highly sensitive space-based gravitational experiments. An example is the LISA Pathfinder charge management system, which uses low-pressure mercury lamps. A…