Related papers: Atom binary holography at a finite distance: Resol…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrofobic resist layer,…
Grid based binary holography (GBH) is an attractive method for patterning with light or matter waves. It is an approximate technique in which different holographic masks can be used to produce similar patterns. Here we present an optimal…
The diffraction of atoms and molecules through tiny, sub-nanometre holes in atomically thin membranes is a promising approach for advancing atom interferometry sensing and atomic holography. However, dispersion interactions, such as the…
Fast production of large area patterns with nanometre resolution is crucial for the established semiconductor industry and for enabling industrial-scale production of next-generation quantum devices. Metastable atom lithography with binary…
The future success of integrated circuits (IC) technology relies on the continuing miniaturization of the feature size, allowing more components per chip and higher speed. Extreme anisotropy opens new opportunities for spatial pattern…
We present a new method for nanoscale atom lithography. We propose the use of a supersonic atomic beam, which provides an extremely high-brightness and cold source of fast atoms. The atoms are to be focused onto a substrate using a thin…
Fast, large area patterning of arbitrary structures down to the nanometre scale is of great interest for a range of applications including the semiconductor industry, quantum electronics, nanophotonics and others. It was recently proposed…
High-resolution patterning of periodic structures over large areas has several applications in science and technology. One such method, based on the long-known Talbot effect observed with diffraction gratings, is achromatic Talbot…
We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with…
Nonlinear metasurface holography shows the great potential of metasurfaces to control the phase, amplitude, and polarization of light while simultaneously converting the frequency of the light. The possibility of tailoring the scattering…
Conventional lithography methods involving pattern transfer through resist templating face challenges of material compatibility with various process solvents. Other approaches of direct material writing often compromise pattern complexity…
Off-axis X-ray holography is a lensless imaging technique that allows unambiguous retrieval of an object's exit-wave function with high fidelity. It has been used with great success to study nanoscale phenomena and spatio-temporal dynamics…
Aligning light spots into arbitrary shapes is a fundamental challenge in holography, leading to various applications across diverse fields in science and engineering. However, as the spot interval approaches the wavelength of light,…
Metasurface holography, the reconstruction of holographic images by modulating the spatial amplitude and phase of light using metasurfaces, has emerged as a next-generation display technology. However, conventional fabrication techniques…
Motivated by the need for less destructive imaging of nanostructures, we pursue point-source in-line holography (also known as point projection microscopy, or PPM) with very low energy electrons (-100 eV). This technique exploits the recent…
We consider the inverse problem of in-line holography, applied to minimally-destructive imaging of cold atom clouds. Absorption imaging near-resonance provides a simple, but destructive measurement of atom column density. Imaging off…
We study the focusing of atoms by multiple layers of standing light waves in the context of atom lithography. In particular, atomic localization by a double-layer light mask is examined using the optimal squeezing approach. Operation of the…
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions.…
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system. The…