Related papers: A synchrotron-based kilowatt-level radiation sourc…
We describe a simple technique to passively bunch non-ultrarelativistics ($\lesssim 10$~MeV) electron bunches produced in conventional photoinjectors. The scheme employs a dielectric-lined waveguide located downstream of the electron source…
Electromagnetic radiation in the soft x-ray spectral range ($1-100~\rm{nm}$ wavelengths or $0.01-1~\rm{keV}$ photon energies) is rapidly gaining importance in both fundamental research and industrial applications. At present the degree of…
A new parameter regime of laser wakefield acceleration driven by sub-petawatt femotsecond lasers is proposed, which enables the generation of relativistic electron mirrors further accelerated by the plasma wave. Integrated particle-in-cell…
VUV radiation around 159 nm is obtained toward direct excitation of a single trapped $^{115}$In$^{+}$ ion. An efficient fluoride-based VUV output-coupler is employed for intracavity high-harmonic generation of a Ti:S oscillator. Using this…
We present two compact ultrafast electron injector designs with integrated focusing that provide high peak brightness of up to $1.9*10^{12} A/m^2Sr^2$ with 10s of electrons per laser pulse using silicon carbide electrodes and silicon…
We report here the results of a one week long investigation into the conceptual design of an X-ray source based on a compact ring with on-orbit and on-energy laser-plasma accelerator. We performed these studies during the June 2016 USPAS…
High coherence visible and near-visible laser sources are centrally important to the operation of advanced position/navigation/timing systems as well as classical/quantum sensing systems. However, the complexity and size of these bench-top…
In this study the generation of energetic coherent extreme ultraviolet (XUV) radiation with controlled polarization, is reported. The XUV radiation results from the process of high harmonic generation (HHG), in a gas phase atomic medium,…
Contact and projection electron radiography of static targets was demonstrated using a laser plasma accelerator driven by a kilojoule, picosecond class laser as a source of relativistic electrons with an average energy of 20 MeV. Objects…
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflective projection optics makes it inaccessible for small-scale…
A setup of a unique x-ray source is put forward employing a relativistic electron beam interacting with two counter-propagating laser pulses in the nonlinear few-photon regime. In contrast to Compton scattering sources, the envisaged x-ray…
Dynamic scattering and imaging with coherent, ultrafast, extreme ultraviolet (EUV) light sources can resolve charge, phonon and spin processes on their intrinsic length and time scales. However, full field coherent diffraction imaging…
In this paper, we propose to combine two promising research topics in accelerator physics, i.e., optical stochastic cooling (OSC) and steady-state microbunching (SSMB). The motivation is to provide a powerful radiation source which could…
The shape of the spectral energy distribution of active galaxies in the EUV--soft X-ray band (13.6 eV to 1 keV) is uncertain because obscuration by dust and gas can hamper our view of the continuum. To investigate the shape of the spectral…
Self consistent analytic and numeric design for a set of electron guns with a high beams quality to be used in high power Ka-band klystrons are presented in this paper. The set of electron guns can be used in the high power Ka-band…
We study the conditions for coherent radiation of an electron bunch driven by a counterpropagating strong pulsed electromagnetic plane wave. We derive the spectrum of the coherent radiation and show that it is emitted backwards with respect…
The paper considers the process of Thomson scattering of coherent diffraction radiation (CDR) produced by the preceding bunch of the accelerator on one of the following bunches. It is shown that the yield of scattered hard photons is…
We present a tunable, continuous-wave (CW) laser system emitting at 213 nm, based on the frequency quadrupling of a single Ti:sapph laser. The setup features two sequential, cavity-enhanced second-harmonic generation (SHG) stages. The first…
The next generation of lithography machines uses extreme ultraviolet (EUV) light originating from laser-produced plasma (LPP) sources, where a small tin droplet is ionized by an intense laser pulse to emit the requested light at 13.5 nm.…
We present the design of a high repetition rate MeV energy ultrafast electron diffraction instrument based on a DC photoelectron gun and an SRF linac with multiple independently controlled accelerating and bunching cavities. The design is…