Related papers: Plasmonic Titanium Nitride via Atomic Layer Deposi…
The main aim of this study is to scrutinize promising plasmonic materials by understanding their electronic structure and correlating them to the optical properties of selected refractory materials. For this purpose, the electronic and…
Platinum, Silver-Platinum embedded Zirconia (Pt/Ag-Pt ZrO2) thin films have been fabricated on silicon wafers and glass substrates using the plasma co-sputtering method. Zirconia thin films are of significant technological importance due to…
The present study delves into exploring the impact of a thin protective layer of scandium nitride (ScN) on the superconductive properties of thin films of niobium nitride (NbN) generated through reactive magnetron deposition. This is the…
Niobium nitride (NbN) is a metallic superconductor that is widely used for superconducting electronics due to its high transition temperature ($T_c$) and kinetic inductance. Processing-induced damage negatively affects the performance of…
High-quality materials are critical for advances in plasmonics, especially as researchers now investigate quantum effects at the limit of single surface plasmons or exploit ultraviolet- or CMOS-compatible metals such as aluminum or copper.…
Plasmonics enables the miniaturization of photonic devices beyond the optical diffraction limit,yet its potential is hindered by inherently large ohmic losses. Hence, it is prudent to explore low loss alternatives to the current mainstay of…
RF sputtered ZnO and Al:ZnO films are attractive transparent conductive oxides for fabrication of opto-electronic devices. In this paper we present efforts to control carrier concentration and mobility of ZnO/Al:ZnO thin films by…
Vapor-pressure-mismatched materials, such as transition metal chalcogenides, have emerged as key electronic, photonic, and quantum materials. Hybrid pulsed laser deposition (hPLD) has become a preferred method for epitaxial or textured…
Fueled by the 5G revolution, the demand for advanced radio frequency micro-electromechanical systems (MEMS) based on AlScN is growing rapidly. However, synthesizing high-quality, textured AlScN thin films is challenging. Current approaches…
This paper details the development of high-quality, c-axis oriented AlN thin films up to 2 {\mu}m thick, using sputtering on platinum-coated SOI substrates for use in piezoelectric MEMS. Our comprehensive studies illustrate how important…
Bulk Scandium trifluoride ($\mathrm{ScF_3}$) is known for a pronounced negative thermal expansion (NTE) over a wide range of temperature, from $10~\mathrm{K}~\text{to}~ 1100~\mathrm{K}$. The structure of $\mathrm{ScF_3}$ can be described as…
Raman studies of nanocomposite SiCN thin film by sputtering showed that with an increase of substrate temperature from room temperature to 500oC, a transition from mostly sp2 graphitic phase to sp3 carbon took place which was observed from…
Second harmonic (SH) radiation can only be generated in non-centrosymmetric bulk crystals under the electric-dipole approximation. Nonlinear thin films made from bulk crystals are technologically challenging because of complex and high…
Optical properties of colloidal plasmonic titanium nitride nanoparticles are examined with an eye on their photothermal via transmission electron microscopy and optical transmittance measurements. Single crystal titanium nitride cubic…
In this study, we fabricate 5-30-nm-thick films of FeSe/STO using pulsed laser deposition (PLD). The grown films exhibit superconductivity with an onset $T_{\mathrm{c}}$ that is much higher than that of bulk FeSe under ambient pressure. The…
The fabrication processes of silicon nitride photonic devices used in foundries require low temperature deposition, which typically leads to high propagation losses. Here, we show that propagation loss as low as 0.42 dB/cm can be achieved…
The optical, elastic anisotropic and thermodynamic properties of TiN in the NaCl (B1) structure are analyzed in detail in the temperature range from 0 to 2000 K and the pressure range from 0 to 20 GPa. From the calculated dielectric…
High quality ZnO thin films were gown using the pulsed laser deposition technique on (0001) Al$_2$O$_3$ substrates in an oxidizing atmosphere, using a Zn metallic target. We varied the growth conditions such as the deposition temperature…
High-quality factor plasmonic devices are crucial components in the fields of nanophotonics, quantum computing and sensing. The majority of these devices are required to be fabricated on non-lattice matched or transparent amorphous…
Electronic devices are progressively fabricated on flexible substrates allowing new fields of applications. A maskless and very flexible structuring process is offered by ablation using ultra-short pulse laser irradiation. Usually, certain…