Related papers: Plasmonic Titanium Nitride via Atomic Layer Deposi…
We report the dielectric functions of insulating tantalum nitride (TaN) films, deposited using atomic layer deposition (ALD) on 300 mm Si/SiO2 substrates, to demonstrate their suitability as tunnel barriers in tantalum-based Josephson…
The thermal emission of refractory plasmonic metamaterial - a titanium nitride 1D grating - is studied at high operating temperature (540 {\deg}C). By choosing a refractory material, we fabricate thermal gratings with high brightness that…
It is a formidable challenge to simultaneously achieve wide gamut, high resolution, high-speed while low-cost manufacturability, long-term stability, and viewing-angle independence in structural colors for practical applications. The…
CdTe and CdS are emerging as the most promising materials for thin film photovoltaics in the quest of the achievement of grid parity. The major challenge for the advancement of grid parity is the achievement of high quality at the same time…
We apply the superconducting proximity effect in TiN/Ti multi-layer films to tune the critical temperature, Tc, to within 10 mK with high uniformity (less than 15 mK spread) across a 75 mm wafer. Reproducible Tc's are obtained from 0.8 -…
Extending plasmonics into the ultraviolet range imposes the use of aluminum to achieve the best optical performance. However, water corrosion is a major limiting issue for UV aluminum plasmonics, as this phenomenon occurs significantly…
The non-homogeneity in the critical temperature $T_{c}$ of an Microwave Kinetic Inductance Detector (MKID) could be caused by non-uniformity in the deposition process of the thin superconducting film. This produces low percent yield and…
Atomic layer deposition (ALD) is an essential tool in semiconductor device fabrication that allows the growth of ultrathin and conformal films to precisely form heterostructures and tune interface properties. The self-limiting nature of the…
In the study presented here, we model the gas phase chemistry induced by plasma discharge at low temperature (150 K) in the NASA Ames COSmIC Simulation Chamber (COSmIC) using a 1-dimensional multi-fluid plasma model named CO-PRISM (COSmIC…
The objective of this work was to study the RF sputtering process parameters optimisation for deposition of Silicon Nitride thin films. The process parameters chosen to be varied were deposition power, deposition duration, flow rate of…
A quantum-limited amplification chain is a fundamental advantage for any application that may benefit from the detection of very faint signals. Reading out arrays of superconducting detectors (TESs or MKIDs), resonant cavities, or qubits,…
Altermagnets are a newly identified class of materials that combine advantageous characteristics of both ferro- and antiferromagnets, making them highly promising for spintronic applications. Hematite has recently been identified as an…
Plasmonic resonances enable strong electromagnetic field confinement and have been widely exploited in plasmonic nanolasers, particularly through surface plasmon polaritons and localized surface plasmons. However, their performance is often…
In this paper, a thermal DC plasma torch was designed and developed for plasma spraying of a titanium nitride layer. Thermal plasma spray torch is a kind of non-transferred torch which can produce a high energy and high temperature plasma…
We report on the charge carrier dynamics of superconducting titanium nitride (TiN) in the frequency range 90 - 510 GHz (3 - 17 cm-1). The experiments were perfomed on a 18 nm thick TiN film with a critical temperature of 3.4 K. Measurements…
Titanium dioxide (TiO$_2$) thin films are commonly used as photocatalytic materials. Here, we enhance the photocatalytic activity of devices based on TiO$_2$ by combining nanostructured glass substrates with metallic plasmonic…
(001)-oriented thin films of the three-dimensional Dirac semimetal cadmium arsenide can realize a quantum spin Hall insulator and other kinds of topological physics, all within the flexible architecture of epitaxial heterostructures. Here,…
Titanium (Ti), due to its excellent properties, is widely exploited in thin film technology that usually leads to the production of {\alpha}-phase (hcp) Ti films. In this work, we investigate the phase evolution of Ti films deposited by…
Nano granular metallic iron (Fe) and titanium dioxide (TiO$_{2-\delta}$) were co-deposited on (100) lanthanum aluminate (LaAlO$_3$) substrates in a low oxygen chamber pressure using a pulsed laser ablation deposition (PLD) technique. The…
Scattering from metal nanoparticles near their localized plasmon resonance; especially, the resonances of noble metals which are mostly in the visible or infrared part of the electromagnetic spectrum; is a way of improving light absorption…