English

Basal-plane growth of cadmium arsenide by molecular beam epitaxy

Materials Science 2019-04-02 v1 Mesoscale and Nanoscale Physics

Abstract

(001)-oriented thin films of the three-dimensional Dirac semimetal cadmium arsenide can realize a quantum spin Hall insulator and other kinds of topological physics, all within the flexible architecture of epitaxial heterostructures. Here, we report a method for growing (001) cadmium arsenide films using molecular beam epitaxy. The introduction of a thin indium arsenide wetting layer improves surface morphology and structural characteristics, as measured by x-ray diffraction and reflectivity, atomic force microscopy, and scanning transmission electron microscopy. The electron mobility of 50-nm-thick films is found to be 9300 cm2/Vs at 2 K, comparable to the highest-quality films grown in the conventional (112) orientation. This work demonstrates a simple experimental framework for exploring topological phases that are predicted to exist in proximity to the three-dimensional Dirac semimetal phase.

Keywords

Cite

@article{arxiv.1904.00254,
  title  = {Basal-plane growth of cadmium arsenide by molecular beam epitaxy},
  author = {David A. Kealhofer and Honggyu Kim and Timo Schumann and Manik Goyal and Luca Galletti and Susanne Stemmer},
  journal= {arXiv preprint arXiv:1904.00254},
  year   = {2019}
}