Related papers: Characteristic diffuse scattering from distinct li…
Increasing miniaturization and complexity of nanostructures require innovative metrology solutions with high throughput that can assess complex 3D structures in a non-destructive manner. EUV scatterometry is investigated for the…
Extreme ultraviolet (EUV) scatterometry is an increasingly important metrology that can measure critical parameters of periodic nanostructured materials in a fast, accurate, and repeatable manner and with high sensitivity to nanoscale…
Periodic nanostructures are fundamental elements in optical instrumentation as well as basis structures in integrated electronic circuits. Decreasing sizes and increasing complexity of nanostructures have made roughness a limiting parameter…
The influence of edge roughness in angle resolved scatterometry at periodically structured surfaces is investigated. A good description of the radiation interaction with structured surfaces is crucial for the understanding of optical…
Controlled and precise fabrication of structures with heights in the range of single digit nanometres is one of the challenges for diffraction gratings operating near-normal incidence in the extreme ultraviolet (EUV) and soft X-ray range.…
Collective lattice dynamics determine essential aspects of condensed matter, such as elastic and thermal properties. These exhibit strong dependence on the length-scale, reflecting the marked wavevector dependence of lattice excitations.…
We discuss the applicability of holographically recorded gratings in photopolymers and holographic polymer-dispersed liquid crystals as neutron optical elements. An experimental investigation of their properties for light and neutrons with…
Extremely asymmetrical scattering (EAS) is an unusual type of Bragg scattering in slanted periodic gratings with the scattered wave (the +1 diffracted order) propagating parallel to the grating boundaries. Here, a unique and strong…
Laterally periodic nanostructures were investigated with grazing incidence small angle X-ray scattering (GISAXS) by using the diffraction patterns to reconstruct the surface shape. To model visible light scattering, rigorous calculations of…
We have studied the optical properties of gratings micro-fabricated into semiconductor wafers, which can be used for simplifying cold-atom experiments. The study entailed characterisation of diffraction efficiency as a function of coating,…
The absence of efficient light modulators for extreme ultraviolet (EUV) and X-ray photons significantly limits their real-life application, particularly when even slight complexity of the beam patterns is required. Here we report on a novel…
We present an optical metrology system for characterization of topography of micro/nano-structures on a surface or embedded in a semi-transparent material. Based on the principles of scatterometry, where the intensity of scattered light is…
It has been seen recently that when probing a nanoscale object to determine, for example, size or position via light scattering, significant advantage in measurement precision can be gained from exploiting phase singularities in a…
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) novel reflective masks have to be used in the production…
This study explores the use of synchrotron measurements as a nanometrology tool for blazed gratings. In grazing incidence geometry, one can measure both the conical diffraction and the diffuse scattering on the grating simultaneously in a…
We demonstrate first- and second-order spatial differentiation of an optical beam transverse profile using thin suspended subwavelength gratings. Highly reflective one-dimensional gratings are patterned on suspended 200 nm-thick silicon…
This paper presents the analysis and characterization of the surface scattering process for both specular and diffused components. The study is focused on the investigation of various building materials each having a different roughness, at…
The optical characterization of dielectric periodic line-gratings for which the period of the grating is significantly larger than the probing wavelength is investigated experimentally, numerically, and analytically. The experimental…
Conventional surface-relief gratings are inefficient at deflecting normally-incident light by large angles. This constrains their use in many applications and limits the overall efficiency of any optical instrument integrating gratings.…
Electron diffraction through a thin patterned silicon membrane can be used to create complex spatial modulations in electron distributions by varying the intensity of different reflections using parameters such as crystallographic…