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Related papers: Microscope Projection Photolithography Based on Ul…

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We developed a microdisplay-based microscope projection photolithography (MDMPP) technique in which a liquid crystal (LC) microdisplay is used as a reconfigurable photomask for a microscope projector. The LC microdisplay provides a…

Physics Education · Physics 2022-03-23 Young-Gu Ju , Hyeon-Jun Kim , Young-Min Ko

We discuss a concept of a point-like source of the extreme ultraviolet (EUV) light based on a non-equilibrium microwave discharge in expanding jet of dense xenon plasma with multiply charged ions. A conversion efficiency of microwave…

Plasma Physics · Physics 2018-10-03 I. S. Abramov , E. D. Gospodchikov , A. G. Shalashov

In this study, we present a complex investigation for miniaturizing of perovskite photodiodes (PPDs) in various geometries with use of ultraviolet laser scribing (UV-LS). Employing a 355 nm (3.5 eV) pulsed laser at 30 kHz, we successfully…

We present a maskless microscope projection lithography system (MPLS), in which photomasks have been replaced by a Digital Micromirror Device type spatial light modulator (DMD, Texas Instruments). Employing video projector technology high…

Quantitative Methods · Quantitative Biology 2009-11-13 Thomas Naiser , Timo Mai , Wolfgang Michel , Albrecht Ott

This paper discusses a simple, low-cost, highly efficient two-mirror projector with a simplified illumination system. The EUV source power can be reduced by 1/10 compared to the current six-mirror EUV projector system. The required EUV…

Optics · Physics 2024-05-21 Tsumoru Shintake

In this study, a procedure for designing a free-form lens for long-range LED illumination is presented. The geometrical form of the proposed lens is obtained by minimizing optical path lengths of the rays emitted from a point-like light…

Optics · Physics 2024-04-02 Ahmet Bingül , Mehmet Adıyaman

Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflective projection optics makes it inaccessible for small-scale…

Microfluidics have emerged as a vital tool in various scientific and engineering applications, ranging from biomedical diagnostics to chemical analysis. However, conventional fabrication methods often necessitate costly equipment and…

Instrumentation and Detectors · Physics 2023-08-07 Habilou Ouro-Koura , Ayobami Ogunmolasuyi , Othman Suleiman , Kausik S Das

Recent advances in LED technology have allowed the development of high-brightness deep-UV LEDs with potential applications in water purification, gas sensing and as excitation sources in fluorescence microscopy. The emission pattern of an…

Instrumentation and Detectors · Physics 2020-06-24 Mollie McFarlane , Gail McConnell

Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. At…

Photoemission electron microscopy was used to image the electrons photoemitted from specially tailored Ag nanoparticles deposited on a Si substrate (with its native oxide SiO$_{x}$). Photoemission was induced by illumination with a Hg…

Analog photonic links require high-fidelity, high-speed optical-to-electrical conversion for applications such as radio-over-fiber, synchronization at kilometer-scale facilities, and low-noise electronic signal generation. Photodetector…

Instrumentation and Detectors · Physics 2018-12-05 J. Davila-Rodriguez , X. Xie , J. Zang , C. J. Long , T. M. Fortier , H. Leopardi , T. Nakamura , J. C. Campbell , S. A. Diddams , F. Quinlan

This paper proposes a simple, four-mirror, in-line projector for high-NA EUV lithography that eliminates the most troublesome mask 3D effect. The design consists of a two-stage concave-convex pair, where optical aberrations are cancelled…

Optics · Physics 2025-08-04 Tsumoru Shintake

We have developed and demonstrated a versatile, compact electron source that can produce a monoenergetic electron beam up to 50 mm diameter from 0.1 to 30 keV with an energy spread of <10 eV. By illuminating a metal cathode plate with a…

Space Physics · Physics 2015-05-30 Kevin Henderson , Ron Harper , Herb Funsten , Elizabeth MacDonald

Light emitting diodes (LEDs) in the deep ultra-violet (DUV) offer new perspectives for multiple applications ranging from 3D printing to sterilization. However, insufficient light extraction severely limits their efficiency. Nanostructured…

A stable reference light source based on an LED (Light Emission Diode) is presented for stabilizing the conversion gain of the opto-electronic system of a gamma- and fast-neutron radiographic and tomographic imaging device. A constant…

Instrumentation and Detectors · Physics 2010-02-09 M. Weierganz , D. Bar , B. Bromberger , V. Dangendorf , G. Feldman , M. B. Goldberg , M. Lindemann , I. Mor , K. Tittelmeier , D. Vartsky

We present an educational tool, a microscope with a video camera, that can be fabricated either from a standard microscope or assembled from inexpensive, commercially available components (objectives, beam splitters, LEDs, linear stages)…

Fourier ptychographic microscopy allows for the collection of images with a high space-bandwidth product at the cost of temporal resolution. In Fourier ptychographic microscopy, the light source of a conventional widefield microscope is…

Image and Video Processing · Electrical Eng. & Systems 2019-01-30 Yi Fei Cheng , Megan Strachan , Zachary Weiss , Moniher Deb , Dawn Carone , Vidya Ganapati

Optical coatings are widespread in everyday life, from camera lenses to glasses, to complex optics experiments. A simple, reliable device that can quickly and inexpensively analyze optical coatings is a valuable laboratory tool. Such a…

Instrumentation and Detectors · Physics 2016-06-10 Kayla Hardie , Sascha Agne , Katanya B. Kuntz , Thomas Jennewein

The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 nm or 11.3…

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