Related papers: Three-dimensional nanoimprint lithography using tw…
Microfluidics is an established multidisciplinary research domain with widespread applications in the fields of medicine, biotechnology and engineering. Conventional production methods of microfluidic chips have been limited to planar…
The fabrication of three-dimensional (3D) nanostructures is of great interest to many areas of nanotechnology currently challenged by fundamental limitations of conventional lithography. One of the most promising direct-write methods for 3D…
Optical metasurfaces, consisting of subwavelength-scale meta-atom arrays, hold great promise to overcome fundamental limitations of conventional optics. Scalable nanomanufacturing of metasurfaces with high uniformity and reproducibility is…
This paper presents a novel method to parallel fabricate large area (wafer scale) metallic nano-split-ring arrays with nanoimprint lithography (NIL). To our knowledge it is the first method that can pattern large area and high dense…
Plasmonic nanolithography is a nanofabrication technique which exploits surface plasmons to generate subdiffraction patterns. In this review, we highlight the key concepts in plasmonic nanolithography, review the pioneering papers and…
The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning…
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system. The…
Colloidal lithography has emerged as a promising alternative to conventional nanofabrication techniques, offering the ability to create nanoscale patterns in a cost-effective and scalable manner. However, it has been so far limited by…
A home made DSP-controlled scanning probe microscope (SPM) system has been developed and its utilization as a tool for lithography on nanometer scale is reported. User-friendly graphic interface allows to directly perform nanolithography…
Since the pioneering work of S.Y. Chou et al.[1] Nano Imprint Lithography (NIL) has emerged as a promising technique for surface patterning, opening for numerous applications ranging from nanophotonics[2] to microfluidics[3]. NIL basically…
Nanoimprint lithography (NIL) is an attractive nonconventional lithographic technique in the fabrication of superconducting nanowires for superconducting nanowire single-photon detectors (SNSPDs) with large effective detection areas or…
The emerging new paradigm of technologies, the internet of things, entails a process of device miniaturization to combine several functional components, such as sensors, actuators, and powering elements, in a single individual on-chip…
Three-dimensional (3D) nano-printing via two-photon polymerization offers unparalleled design flexibility and precision, thereby enabling rapid prototyping of advanced micro-optical elements and systems, including hybrid achromats,…
The spatially precise integration of arrays of micro-patterned two-dimensional (2D) crystals onto three-dimensionally structured Si/SiO$_2$ substrates represents an attractive strategy towards the low-cost system-on-chip integration of…
Classical microcontact printing involves transfer of molecules adsorbed on the outer surfaces of solid stamps to substrates to be patterned. We prepared spongy mesoporous silica stamps that can be soaked with ink and that were…
Light-matter interactions in the deep ultraviolet (DUV) wavelength region exhibits a variety of optical effects such as luminescence, photoisomerization, and polymerization in many materials. Despite the rich photochemistry and high spatial…
Colloidal lithography [1] is how patterns are reproduced in a variety of natural systems and is used more and more as an efficient fabrication tool in bio-, opto-, and nano-technology. Nanoparticles in the colloid are made to form a mask on…
Modern imaging systems can be enhanced in efficiency, compactness, and application through introduction of multilayer nanopatterned structures for manipulation of light based on its fundamental properties. High transmission efficiency…
With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrofobic resist layer,…
We present a new method for nanoscale atom lithography. We propose the use of a supersonic atomic beam, which provides an extremely high-brightness and cold source of fast atoms. The atoms are to be focused onto a substrate using a thin…