Related papers: Deep Reactive Ion Etched Anti-Reflection Coatings …

Silicon optics with wide bandwidth anti-reflection (AR) coatings, made of multi-layer textured silicon surfaces, are developed for millimeter and submillimeter wavelengths. Single and double layer AR coatings were designed for an optimal…

Although high-resistivity, low-loss silicon is an excellent material for THz transmission optics, its high refractive index necessitates antireflection treatment. We fabricated a wide-bandwidth, two-layer antireflection treatment by cutting…

The increasing scale of cryogenic detector arrays for sub-millimeter and millimeter wavelength astrophysics has led to the need for large aperture, high index of refraction, low loss, cryogenic refracting optics. Silicon with n = 3.4, low…

We present the design, fabrication, and characterization of a 100 mm diameter, flat, gradient-index (GRIN) lens fabricated with high-resistivity silicon, combined with a three-layer anti-reflection (AR) structure optimized for 160-355 GHz.…

We have developed and tested an antireflection (AR) coating method for silicon lenses at cryogenic temperatures and millimeter wavelengths. Our particular application is a measurement of the cosmic microwave background. The coating consists…

Broadband refractive optics realized from high index materials provide compelling design solutions for the next generation of observatories for the Cosmic Microwave Background (CMB), and for sub-millimeter astronomy. In this paper, work is…

Infrared (IR) blocking filters are crucial for controlling the radiative loading on cryogenic systems and for optimizing the sensitivity of bolometric detectors in the far-IR. We present a new IR filter approach based on a combination of…

We demonstrate a silicon-based, single-layer anti-reflection coating that suppresses the reflectivity of metals at near-infrared frequencies, enabling optical probing of nano-scale structures embedded in highly reflective surroundings. Our…

We developed a broadband two-layer anti-reflection (AR) coating for use on a sapphire half-wave plate (HWP) and an alumina infrared (IR) filter for the cosmic microwave background (CMB) polarimetry. Measuring the faint CMB B-mode signals…

We present the novel design of microfabricated, silicon-substrate based mirrors for use in cryogenic Fabry-Perot Interferometers (FPIs) for the mid-IR to sub-mm/mm wavelength regime. One side of the silicon substrate will have a…

We present the design, fabrication, and measured performance of metamaterial Anti-Reflection Cuttings (ARCs) for large-format alumina filters operating over more than an octave of bandwidth to be deployed on the Simons Observatory (SO). The…

A fundamental capability for any transmissive optical component is anti-reflection, yet this capability is challenging to achieve in a cost-efficient manner over longer infrared wavelengths. We demonstrate that Mie resonant nanophotonic…

Future millimeter wavelength experiments aim to both increase aperture diameters and broaden bandwidths to increase the sensitivity of the receivers. These changes produce a challenging anti-reflection (AR) design problem for refracting and…

We present a broadband plasma spray anti-reflection (AR) coating technology for millimeter-wave astrophysics experiments with large-format, cryogenic optics. By plasma spraying alumina- and silica-based powders, we have produced coatings of…

We report two anti-reflection (AR) coatings that give better quantum efficiency (QE) than the existing AR coating on the Gaia astrometric field (AF) CCDs. Light being the core of optical astronomy is extremely important for such missions,…

Silicon carbide (SiC) is a highly promising material for the rapidly growing UV detection industry due to its visible-blindness, low dark current, and exceptional thermal and chemical stability. Despite these advantages, the performance of…

We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by use of standard industrial high throughput silicon processing techniques: UV Nano Imprint Lithography (UV-NIL) combined with continuous Reactive…

Vertically aligned silicon micro/nanowire arrays of different sizes have been synthesized by combining the modified metal-assisted chemical etching (MACE) and reactive ion etching (RIE) methods. This is a novel lithography-free method to…

Deep reactive ion etching (DRIE) with the Bosch process is one of the key procedures used to manufacture micron-sized structures for MEMS and microfluidic applications in silicon and, hence, of increasing importance for miniaturization in…

We report on the development of coatings for a CCD detector optimized for use in a fixed dispersion UV spectrograph. Due to the rapidly changing index of refraction of Si, single layer broadband anti-reflection coatings are not suitable to…