Related papers: Process stabilization by peak current regulation i…
We report a systematic comparison of niobium nitride thin films deposited on oxidized silicon substrates by reactive DC magnetron sputtering and reactive high-power impulse magnetron sputtering (HiPIMS). After determining the nitrogen gas…
The growth rate during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride is measured with a temporal resolution of up to 25 us using a rotating shutter concept. According to that concept a 200 um slit is rotated…
The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated for the reactive sputter deposition of TiN thin films.…
High-power impulse magnetron sputtering (HiPIMS) offers considerable control over ion energy and flux, making it invaluable for tailoring the microstructure and properties of advanced functional coatings. However, compared to conventional…
High-power impulse magnetron sputtering (HiPIMS) delivers a high target power in short pulses, enhancing the ionization and energy of sputtered atoms and providing thus more possibilities to control the film properties. This study explores…
In this work, we studied phase formation, structural and magnetic properties of iron-nitride (Fe-N) thin films deposited using high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (dc-MS). The nitrogen…
Ionized physical vapor deposition techniques, such as high-power impulse magnetron sputtering (HiPIMS) are gaining popularity due to their ability to produce high-quality thin films at low deposition temperatures. In those techniques, ions…
In the ionization region above circular planar magnetrons well defined regions of high emissivity are observed, when the discharge is driven in the HiPIMS regime. Once their mode is stabilized, these structures rotate in the E x B direction…
Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it…
The discharges in high power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are…
In order to improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionization of the sputtered vapor, we developed an ionized physical vapor deposition method based on pre-ionized pulsed magnetron…
High-Power Impulse Magnetron Sputtering (HiPIMS) offers higher ionized flux fractions at the cost of lower deposition rates compared to conventional DCMS. A fine optimization of the deposition conditions is crucial for specific…
High power pulsed magnetron sputtering (HPPMS) plasmas are pulsed discharges where the plasma composition as well as the fluxes and energies of ions are changing during the pulse. The time resolved energy distribution for Ar$^{1+}$ ions was…
Magnetrons are widely used as a high-efficiency, large-power, and low-cost microwave source. This article proposes a method to improve the magnetron output characteristics based on regulating its anode current by a novel active distortion…
The present work details the analysis of the aerodynamics of an experimental swirl stabilized burner representative of gas turbine combustors. This analysis is carried out using High Frequency PIV (HFPIV) measurements in a reactive…
The demand for efficient data processing motivates a shift toward in-memory computing architectures. Ferroelectric materials, particularly AlScN, show great promise for next-generation memory devices. However, their widespread application…
The present study investigates photochromic oxygen-containing yttrium hydride (YHO) thin films deposited by reactive high power impulse magnetron sputtering (HiPIMS) and compares their photochromic, optical, and structural properties with…
We studied the growth behavior, structural, electronic, and magnetic properties of cobalt nitride (Co-N) thin films deposited using direct current (dc) and high power impulse magnetron sputtering (HiPIMS) processes. The N$_2$ partial gas…
Titanium dioxide (TiO2) is a key material in optoelectronic and energy conversion technologies, including solar cells and photocatalysis. However, integrating TiO2 into flexible or temperature-sensitive devices requires deposition…
We present a comparative study of copper film growth with a constant energy neutral beam, thermal evaporation, dc magnetron sputtering, high-power impulse magnetron sputtering (HiP-IMS), and bipolar HiPIMS, through molecular dynamics…