Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Akhil Tayal; Mukul Gupta; Ajay Gupta; V. Ganesan; Layanta Behera; Surendra Singh; Saibal Basu

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Materials Science 2014-11-25 v2

Authors: Akhil Tayal , Mukul Gupta , Ajay Gupta , V. Ganesan , Layanta Behera , Surendra Singh , Saibal Basu

Abstract

In this work, we studied phase formation, structural and magnetic properties of iron-nitride (Fe-N) thin films deposited using high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (dc-MS). The nitrogen partial pressure during deposition was systematically varied both in HiPIMS and dc-MS. Resulting Fe-N films were characterized for their microstructure, magnetic properties and nitrogen concentration. We found that HiPIMS deposited Fe-N films show a globular nanocrystalline microstructure and improved soft magnetic properties. In addition, it was found that the nitrogen reactivity impedes in HiPIMS as compared to dc-MS. Obtained results can be understood in terms of distinct plasma properties of HiPIMS.

Keywords

iron nitride thin films high power impulse magnetron sputtering hipims magnetic properties microstructure nitrogen reactivity dc magnetron sputtering

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@article{arxiv.1411.1614,
  title  = {Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering},
  author = {Akhil Tayal and Mukul Gupta and Ajay Gupta and V. Ganesan and Layanta Behera and Surendra Singh and Saibal Basu},
  journal= {arXiv preprint arXiv:1411.1614},
  year   = {2014}
}

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7 Pages, 7 Figures

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Abstract

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