Related papers: Characterization of multilayer stack parameters fr…
X-ray resonant magnetic reflectivity (XRMR) is a powerful method to determine the optical, structural and magnetic depth profiles of a variety of thin films. Here, we investigate samples of different complexity all measured at the Pt L$_3$…
Future hard X-ray telescopes (e.g. SIMBOL-X and Constellation-X) will make use of hard X-ray optics with multilayer coatings, with angular resolutions comparable to the achieved ones in the soft X-rays. One of the crucial points in X-ray…
To enhance the reflectivity of X-ray mirrors beyond the critical angle, multilayer coatings are required. Interface imperfections in the multilayer growth process are known to cause non-specular scattering and degrade the mirror optical…
Microstructural characterization of synthetic periodic multilayers by x-ray standing waves have been presented. It has been shown that the analysis of multilayers by combined x-ray reflectometry (XRR) and x-ray standing wave (XSW)…
Multilayer X-ray mirrors consist of a coating of a large number of alternate layers of high Z and low Z materials with a typical thickness of 10-100 Angstrom, on a suitable substrate. Such coatings play an important role in enhancing the…
X-ray reflectometry (XRR) provides researchers and manufacturers with a non-destructive way to determine thickness, roughness, and density of thin films deposited on smooth substrates. Due to the nested nature of equations modeling this…
The LAMP (Lightweight Asymmetry and Magnetism Probe) X-ray telescope is a mission concept to measure the polarization of X-ray astronomical sources at 250 eV via imaging mirrors that reflect at incidence angles near the polarization angle,…
X-ray reflectivity (XRR) is a powerful and popular scattering technique that can give valuable insight into the growth behavior of thin films. In this study, we show how a simple artificial neural network model can be used to predict the…
Coating thickness measurement and inspection of defects beneath optically opaque surfaces are among the most promising commercial applications of the terahertz (THz) imaging technology. However, there are two main sources of complexity in…
Uniform powder spreading is a requisite for creating consistent, high-quality components via powder bed additive manufacturing (AM), wherein layer density and uniformity are complex functions of powder characteristics, spreading kinematics,…
A versatile X-ray/neutron reflectivity (specular) simulator using LabVIEW(National Instruments Corp.) for structural study of a multi-layer thin film having any combination, including the repetitions, of nano-scale layers of different…
Many nano and quantum devices, with their sizes often spanning from millimeters down to sub-nanometer, have intricate low-dimensional, non-uniform, or hierarchical structures on surfaces and interfaces. Since their functionalities are…
With the advent of both modern X-ray fluorescence (XRF) methods and improved analytical reliability requirements the demand for suitable reference samples has increased. Especially in nanotechnology with the very low areal mass depositions,…
While a linear growth behavior is one of the fingerprints of textbook atomic layer deposition processes, the growth often deviates from that behavior in the initial regime, i.e. the first few cycles of a process. To properly understand the…
Fabrication of semiconductor heterostructures is now so precise that metrology has become a key challenge for progress in science and applications. It is now relatively straightforward to characterize classic III-V and group IV…
X-ray reflectivity (XRR) is widely used for thin-film structure analysis, and XRR data analysis involves minimizing the difference between an XRR curve calculated from model parameters describing the thin-film structure. This analysis takes…
By adjusting the incidence angle of incoming X-ray near the critical angle of X-ray total reflection, the photoelectron intensity is strongly modulated due to the variation of X-ray penetration depth. Photoelectron spectroscopy (PES)…
Designing a multi-layer optical system with designated optical characteristics is an inverse design problem in which the resulting design is determined by several discrete and continuous parameters. In particular, we consider three design…
The development of multi-layer optics which allow to focus photons up to 100 keV and more promises an enormous jump in sensitivity in the hard X-ray energy band. This technology is already planned to be exploited by future missions…
An approach for measuring linear X-ray polarization over a broad-band using conventional spectroscopic optics is described. A set of multilayer-coated flats reflect the dispersed X-rays to the instrument detectors. The intensity variation…