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Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character projection (CP) technique, where some complex shapes…
In this work multilevel pattering capabilities of Substrate Conformal Imprint Lithography (SCIL) have been explored. A mix & match approach combining the high throughput of nanoimprint lithography with the excellent overlay accuracy of…
Maintaining the highest quality and output of photon science in the VUV-, EUV-, soft- and tender-X-ray energy ranges requires high-quality blazed profile gratings. Currently, their availability is critical due to technological challenges…
Scanning Transmission Electron Microscopy (STEM) coupled with Electron Energy Loss Spectroscopy (EELS) presents a powerful platform for detailed material characterization via rich imaging and spectroscopic data. Modern electron microscopes…
Programmable electron-beam scanning offers new opportunities to improve dose efficiency and suppress scan-induced artifacts in scanning transmission electron microscopy. Here, we systematically benchmark the impact of non-raster…
High-Resolution Electron Backscatter Diffraction (HR-EBSD) has advanced rapidly in recent years, significantly improving elastic strain measurements and dislocation density evaluation with submicron spatial resolution. To achieve better…
Accurately determining the crystallographic structure of a material, organic or inorganic, is a critical primary step in material development and analysis. The most common practices involve analysis of diffraction patterns produced in…
Stencil algorithms on regular lattices appear in many fields of computational science, and much effort has been put into optimized implementations. Such activities are usually not guided by performance models that provide estimates of…
Scanning electron microscopy (SEM), a century-old technique, is today a ubiquitous method of imaging the surface of nanostructures. However, most SEM detectors simply count the number of secondary electrons from a material of interest, and…
Clustering is a fundamental task in both machine learning and data mining. Among various methods, edge-colored clustering (ECC) has emerged as a useful approach for handling categorical data. Given a hypergraph with (hyper)edges labeled by…
Electron-beam direct-write (EBDW) lithography systems must in the future transmit terabits of information per second to be viable for commercial semiconductor manufacturing. Lossless layout image compression algorithms with high decoding…
Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist material plays a key role and must have high resolution,…
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of next-generation lithography technology. As the feature size…
Recent progress in effective nonlinearity, achieved by exploiting multiple scatterings within the linear optical regime, has been demonstrated to be a promising approach to enable nonlinear optical processing without relying on actual…
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflective projection optics makes it inaccessible for small-scale…
Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. Conventional LELELE type TPL technology suffers from native conflict and overlapping problems. Recently, as an alternative…
Layout fracturing is a fundamental step in mask data preparation and e-beam lithography (EBL) writing. To increase EBL throughput, recently a new L-shape writing strategy is proposed, which calls for new L-shape fracturing, versus the…
Very high energy (VHE; $E \geq$ 100GeV) $\gamma-$ray from cosmological distances are attenuated by the extragalactic background light (EBL) in the IR to UV band. By contrasting measured versus intrinsic emission, the EBL photon density can…
Moore Law states that transistor density will double every two years, which is sustained until today due to continuous multi-directional innovations, such as extreme ultraviolet lithography, novel patterning techniques etc., leading the…
Currently there has been increasing demand for real-time training on resource-limited IoT devices such as smart sensors, which realizes standalone online adaptation for streaming data without data transfers to remote servers. OS-ELM (Online…