Universal scheme to generate metal-insulator transition in disordered systems
Abstract
We propose a scheme to generate metal-insulator transition in random binary layer (RBL) model, which is constructed by randomly assigning two types of layers. Based on a tight-binding Hamiltonian, the localization length is calculated for a variety of RBLs with different cross section geometries by using the transfer-matrix method. Both analytical and numerical results show that a band of extended states could appear in the RBLs and the systems behave as metals by properly tuning the model parameters, due to the existence of a completely ordered subband, leading to a metal-insulator transition in parameter space. Furthermore, the extended states are irrespective of the diagonal and off-diagonal disorder strengths. Our results can be generalized to two- and three-dimensional disordered systems with arbitrary layer structures, and may be realized in Bose-Einstein condensates.
Keywords
Cite
@article{arxiv.1211.5641,
title = {Universal scheme to generate metal-insulator transition in disordered systems},
author = {Ai-Min Guo and Shi-Jie Xiong and X. C. Xie and Qing-feng Sun},
journal= {arXiv preprint arXiv:1211.5641},
year = {2015}
}
Comments
5 ages, 4 figures