English

Ultra-low switching current density in all-amorphous W-Hf / CoFeB / TaOx films

Materials Science 2020-09-23 v3

Abstract

We study current-induced deterministic magnetization switching and domain wall motion via polar Kerr microscopy in all-amorphous W66_{66}Hf34_{34}/CoFeB/TaOx_\text{x} with perpendicular magnetic anisotropy and large spin Hall angle. Investigations of magnetization switching as a function of in-plane assist field and current pulse-width yield switching current densities as low as 3×1093\times 10^{9} A/m2^2. We accredit this low switching current density to a low depinning current density, which was obtained from measurements of domain wall displacements upon current injection. This correlation is verified by investigations of a Ta/CoFeB/MgO/Ta reference sample, which showed critical current densities of at least one order of magnitude larger, respectively.

Keywords

Cite

@article{arxiv.1910.13837,
  title  = {Ultra-low switching current density in all-amorphous W-Hf / CoFeB / TaOx films},
  author = {Katharina Fritz and Lukas Neumann and Markus Meinert},
  journal= {arXiv preprint arXiv:1910.13837},
  year   = {2020}
}

Comments

9 pages, 8 figures