Twenty-nine million Intrinsic Q-factor Monolithic Microresonators on Thin Film Lithium Niobate
Abstract
The recent emergence of thin-film lithium niobate (TFLN) has extended the landscape of integrated photonics. This has been enabled by the commercialization of TFLN wafers and advanced nanofabrication of TFLN such as high-quality dry etching. However, fabrication imperfections still limit the propagation loss to a few dB/m, restricting the impact of this platform. Here, we demonstrate TFLN microresonators with a record-high intrinsic quality (Q) factor of twenty-nine million, corresponding to an ultra-low propagation loss of 1.3 dB/m. We present spectral analysis and the statistical distribution of Q factors across different resonator geometries. Our work pushes the fabrication limits of TFLN photonics to achieve a Q factor within one order of magnitude of the material limit.
Keywords
Cite
@article{arxiv.2402.16161,
title = {Twenty-nine million Intrinsic Q-factor Monolithic Microresonators on Thin Film Lithium Niobate},
author = {Xinrui Zhu and Yaowen Hu and Shengyuan Lu and Hana K. Warner and Xudong Li and Yunxiang Song and Leticia Magalhaes and Amirhassan Shams-Ansari and Neil Sinclair and Marko Loncar},
journal= {arXiv preprint arXiv:2402.16161},
year = {2024}
}