Tungsten silicide films for microwave kinetic inductance detectors

Thomas Cecil; Antonino Miceli; Orlando Quaranta; Chian Liu; Daniel Rosenmann; Sean McHugh; Benjamin Mazin

doi:10.1063/1.4737408

Tungsten silicide films for microwave kinetic inductance detectors

Superconductivity 2012-07-19 v2 Instrumentation and Detectors

Authors: Thomas Cecil , Antonino Miceli , Orlando Quaranta , Chian Liu , Daniel Rosenmann , Sean McHugh , Benjamin Mazin

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Abstract

Microwave Kinetic Inductance Detectors (MKIDs) provide highly multiplexed arrays of detectors that can be configured to operate from the sub-millimeter to the X-ray regime. We have examined two tungsten silicide alloys (W5Si3 and WSi2), which are dense alloys that provide a critical temperature tunable with composition, large kinetic inductance fraction, and high normal-state resistivity. We have fabricated superconducting resonators and provide measurement data on critical temperature, surface resistance, quality factor, noise, and quasiparticles lifetime. Tungsten silicide appears to be promising for microwave kinetic inductance detectors.

Keywords

tungsten silicide microwave kinetic inductance detectors MKIDs superconducting resonators critical temperature kinetic inductance quasiparticle lifetime

Cite

@article{arxiv.1203.5064,
  title  = {Tungsten silicide films for microwave kinetic inductance detectors},
  author = {Thomas Cecil and Antonino Miceli and Orlando Quaranta and Chian Liu and Daniel Rosenmann and Sean McHugh and Benjamin Mazin},
  journal= {arXiv preprint arXiv:1203.5064},
  year   = {2012}
}

Tungsten silicide films for microwave kinetic inductance detectors

Abstract

Keywords

Cite

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