We present a new method to obtain topological insulator Bi2Se3 thin films with a centimeter large lateral length. To produce amorphous Bi2Se3 thin films we have used a sequential flash-evaporation method at room temperature. Transmission electron microscopy has been used to verify that the prepared samples are in a pure amorphous state. During annealing the samples transform into the rhombohedral Bi2Se3 crystalline strcuture which was confirmed using X-ray diffraction and Raman spectroscopy. Resistance measurements of the amorphous films show the expected Mott variable range hopping conduction process with a high specific resistance compared to the one obtained in the crystalline phase (metallic behavior). We have measured the magnetoresistance (MR) and the Hall effect (HE) at different temperatures between 2 K and 275 K. At temperatures T≲50 K and fields B≲1 T we observe weak anti-localization in the MR; the Hall measurements confirm the n-type character of the samples. All experimental results of our films are in quantitative agreement with results from samples prepared using more sophisticated methods.
@article{arxiv.1502.01135,
title = {Topological Insulator Thin Films Starting from the Amorphous Phase - Bi$_2$Se$_3$ as Example},
author = {J. Barzola-Quiquia and T. Lehmann and M. Stiller and D. Spemann and P. Esquinazi and P. Häussler},
journal= {arXiv preprint arXiv:1502.01135},
year = {2015}
}
Comments
8 pages, 9 figures, to be published in Journal of Applied Physics (2015)