English

Topological Insulator Thin Films Starting from the Amorphous Phase - Bi$_2$Se$_3$ as Example

Materials Science 2015-06-23 v1

Abstract

We present a new method to obtain topological insulator Bi2_2Se3_3 thin films with a centimeter large lateral length. To produce amorphous Bi2_2Se3_3 thin films we have used a sequential flash-evaporation method at room temperature. Transmission electron microscopy has been used to verify that the prepared samples are in a pure amorphous state. During annealing the samples transform into the rhombohedral Bi2_2Se3_3 crystalline strcuture which was confirmed using X-ray diffraction and Raman spectroscopy. Resistance measurements of the amorphous films show the expected Mott variable range hopping conduction process with a high specific resistance compared to the one obtained in the crystalline phase (metallic behavior). We have measured the magnetoresistance (MR) and the Hall effect (HE) at different temperatures between 2 K and 275 K. At temperatures T50T \lesssim 50 K and fields B1B \lesssim 1 T we observe weak anti-localization in the MR; the Hall measurements confirm the n-type character of the samples. All experimental results of our films are in quantitative agreement with results from samples prepared using more sophisticated methods.

Keywords

Cite

@article{arxiv.1502.01135,
  title  = {Topological Insulator Thin Films Starting from the Amorphous Phase - Bi$_2$Se$_3$ as Example},
  author = {J. Barzola-Quiquia and T. Lehmann and M. Stiller and D. Spemann and P. Esquinazi and P. Häussler},
  journal= {arXiv preprint arXiv:1502.01135},
  year   = {2015}
}

Comments

8 pages, 9 figures, to be published in Journal of Applied Physics (2015)

R2 v1 2026-06-22T08:21:41.389Z