English

Thickness-dependent bulk properties and weak anti-localization effect in topological insulator Bi2Se3

Materials Science 2011-08-30 v2

Abstract

We show that a number of transport properties in topological insulator (TI) Bi2Se3 exhibit striking thickness-dependences over a range of up to five orders of thickness (3 nm - 170 \mu m). Volume carrier density decreased with thickness, presumably due to diffusion-limited formation of selenium vacancies. Mobility increased linearly with thickness in the thin film regime and saturated in the thick limit. The weak anti-localization effect was dominated by a single two-dimensional channel over two decades of thickness. The sublinear thickness-dependence of the phase coherence length suggests the presence of strong coupling between the surface and bulk states.

Keywords

Cite

@article{arxiv.1104.0913,
  title  = {Thickness-dependent bulk properties and weak anti-localization effect in topological insulator Bi2Se3},
  author = {Yong Seung Kim and Matthew Brahlek and Namrata Bansal and Eliav Edrey and Gary A. Kapilevich and Keiko Iida and Makoto Tanimura and Yoichi Horibe and Sang-Wook Cheong and Seongshik Oh},
  journal= {arXiv preprint arXiv:1104.0913},
  year   = {2011}
}

Comments

16 pages, 4 figures