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Thermoelectric transport perpendicular to thin film heterostructures using Monte Carlo technique

Materials Science 2009-11-11 v1

Abstract

The Monte Carlo technique is used to calculate electrical as well as thermoelectric transport properties across thin film heterostructures. We study a thin InGaAsP barrier layer sandwiched between two InGaAs contact layers, when the barrier thickness is in 50nm-2000nm range. We found that with decreasing size, the effective Seebeck coefficient is increased substantially. The transition between pure ballistic thermionic transport and fully diffusive thermoelectric transport is also described.

Keywords

Cite

@article{arxiv.cond-mat/0610056,
  title  = {Thermoelectric transport perpendicular to thin film heterostructures using Monte Carlo technique},
  author = {Mona Zebarjadi and Ali Shakouri and Keivan Esfarjani},
  journal= {arXiv preprint arXiv:cond-mat/0610056},
  year   = {2009}
}