The Coherent Interlayer Resistance of a Single, Rotated Interface between Two Stacks of AB Graphite
Mesoscale and Nanoscale Physics
2014-08-27 v2
Abstract
The coherent, interlayer resistance of a misoriented, rotated interface between two stacks of AB graphite is determined for a variety of misorientation angles. The quantum-resistance of the ideal AB stack is on the order of 1 to 10 m. For small rotation angles, the coherent interlayer resistance exponentially approaches the ideal quantum resistance at energies away from the charge neutrality point. Over a range of intermediate angles, the resistance increases exponentially with cell size for minimum size unit cells. Larger cell sizes, of similar angles, may not follow this trend. The energy dependence of the interlayer transmission is described.
Keywords
Cite
@article{arxiv.1309.7071,
title = {The Coherent Interlayer Resistance of a Single, Rotated Interface between Two Stacks of AB Graphite},
author = {K. M. Masum Habib and Somaia S. Sylvia and Supeng Ge and Mahesh Neupane and Roger K. Lake},
journal= {arXiv preprint arXiv:1309.7071},
year = {2014}
}