Texture of ZnO thin films deposited through microwave irradiation

Piyush Jaiswal; Sanjaya Brahma; K. S. Suresh; S. A. Shivashankar; Satyam Suwas

doi:10.1016/j.tsf.2015.09.005

Texture of ZnO thin films deposited through microwave irradiation

Materials Science 2017-09-29 v1

Authors: Piyush Jaiswal , Sanjaya Brahma , K. S. Suresh , S. A. Shivashankar , Satyam Suwas

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Abstract

We report the crystallographic texture of ZnO thin films comprising nanorods grown by a microwave irradiation assisted method. Different substrates were used, namely Si, Ge, metal coated Si, PMMA coated Si and ITO coated glass, to examine the respective development of crystallographic texture. The films were characterized by Xray diffraction and scanning electron microscopy, while the texture analysis was done by Xray pole figure analysis using the Schultz reflection method. The ZnO film deposited on Si and Ge showed a mixed texture. On all the other substrates, c axis oriented ZnO films were obtained.

Keywords

ZnO thin films crystallographic texture microwave irradiation nanorods X-ray diffraction pole figure analysis Schultz reflection method c-axis orientation

Cite

@article{arxiv.1307.6704,
  title  = {Texture of ZnO thin films deposited through microwave irradiation},
  author = {Piyush Jaiswal and Sanjaya Brahma and K. S. Suresh and S. A. Shivashankar and Satyam Suwas},
  journal= {arXiv preprint arXiv:1307.6704},
  year   = {2017}
}

Texture of ZnO thin films deposited through microwave irradiation

Abstract

Keywords

Cite

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