SrSnO3 (SSO) is an emerging ultra-wide bandgap (UWBG) semiconductor with potential for highpower applications. In-plane compressive strain was recently shown to stabilize the high temperature tetragonal phase of SSO at room temperature (RT) which exists at T > 1062 K in bulk. Here, we report on the study of strain relaxation in epitaxial, tetragonal phase of Nd-doped SSO films grown on GdScO3 (110) (GSO) substrates using radical-based hybrid molecular beam epitaxy. The thinnest SSO film (thickness, t = 12 nm) yielded a fully coherent tetragonal phase at RT. At 12 nm < t < 110 nm, the tetragonal phase first transformed into orthorhombic phase and then at t > 110 nm, the orthorhombic phase began to relax by forming misfit dislocations. Remarkably, the tetragonal phase remained fully coherent until it completely transformed into the orthorhombic phase. Using thickness- and temperature-dependent electronic transport measurements, we discuss the important roles of the surface, phase coexistence, and misfit dislocations on carrier density and mobility in Nd-doped SSO. This study provides unprecedented insights into the strain relaxation behavior and its consequences for electronic transport in doped SSO with implications in the development of high-power electronic devices.
@article{arxiv.2010.09817,
title = {Strain Relaxation via Phase Transformation in SrSnO3},
author = {Tristan K Truttmann and Fengdeng Liu and Javier Garcia Barriocanal and Richard D. James and Bharat Jalan},
journal= {arXiv preprint arXiv:2010.09817},
year = {2020}
}