Quantum Geometric Engineering of Dual Hall Effects in 2D Antiferromagnetic Bilayers via Interlayer Magnetic Coupling
Abstract
The interplay between quantum geometry and magnetic order offers a novel strategy for designing next-generation nanodevices. Here, we demonstrate that interlayer magnetic coupling in two-dimensional (2D) CoPSe3 bilayers enables precise control over quantum geometric mechanisms, unlocking dual intrinsic Hall effects. Our first-principles calculations reveal that the altermagnetic (AM) phase exhibits a giant anisotropic anomalous Hall effect (AHE) ( is approximately 46 S/cm) driven by Berry curvature localized at generic k-points, while the PT-symmetric antiferromagnetic (AFM) phase hosts an intrinsic second-order nonlinear anomalous Hall effect (NAHE) ( is approximately 160 S/V) originating from quantum metric accumulation at high-symmetry k-points. By tuning interlayer magnetic couplings, we achieve reversible switching between these phases, leveraging their distinct band structures and symmetry constraints. The Neel-vector-dependent AHE in the AM phase and the symmetry-protected NAHE in the AFM phase highlight quantum geometry as a versatile tool for manipulating transport properties. Our work establishes 2D antiferromagnets as a promising platform for multifunctional device architectures, bridging linear and nonlinear magnetoelectric responses through tailored quantum geometric engineering.
Keywords
Cite
@article{arxiv.2503.03143,
title = {Quantum Geometric Engineering of Dual Hall Effects in 2D Antiferromagnetic Bilayers via Interlayer Magnetic Coupling},
author = {Zhenning Sun and Tao Wang and Hao Jin and Xinru Li and Yadong Wei and Jian Wang},
journal= {arXiv preprint arXiv:2503.03143},
year = {2025}
}