English

Putative hybridization gap in CaMn$_{2}$Bi$_{2}$ under applied pressure

Strongly Correlated Electrons 2019-07-24 v1

Abstract

We report electrical transport measurements on CaMn2_{2}Bi2_{2} single crystals under applied pressure. At ambient pressure and high temperatures, CaMn2_{2}Bi2_{2} behaves as a single-band semimetal hosting N\'{e}el order at TN=150T_{N}=150~K. At low temperatures, multi-band behavior emerges along with an activated behavior typical of degenerate semiconductors. The activation gap is estimated to be Δ20\Delta \sim 20~K. Applied pressure not only favors the antiferromagnetic order at a rate of 0.40(2)~K/kbar, but also enhances the activation gap at 2020~kbar by about 7070~\%. This gap enhancement is typical of correlated narrow-gap semiconductors such as FeSi and Ce3_{3}Bi4_{4}Pt3_{3}, and places CaMn2_{2}Bi2_{2} as a Mn-based hybridization-gap semiconductor candidate. \textit{Ab initio} calculations based on the density functional theory are shown to be insufficient to describe the ground state of CaMn2_{2}Bi2_{2}.

Keywords

Cite

@article{arxiv.1907.09984,
  title  = {Putative hybridization gap in CaMn$_{2}$Bi$_{2}$ under applied pressure},
  author = {M. M. Piva and S. M. Thomas and Z. Fisk and J. -X. Zhu and J. D. Thompson and P. G. Pagliuso and P. F. S. Rosa},
  journal= {arXiv preprint arXiv:1907.09984},
  year   = {2019}
}

Comments

7 pages, 5 figures

R2 v1 2026-06-23T10:28:31.834Z