English

Orthogonal and Non-Orthogonal Tight Binding parameters for III-V Semiconductors Nitrides

Materials Science 2016-09-21 v1

Abstract

A simulated annealing (SA) approach is employed in the determination of different tight binding (TB) sets of parameters for the nitride semiconductors AlN, GaN and InN, as well their limitations and potentialities are also discussed. Two kinds of atomic basis set are considered: (\textit{i}) the orthogonal sp3ssp^3s* with interaction up to second neighbors and (\textit{ii}) a spdspd non-orthogonal set, with the Hamiltonian matrix elements calculated within the Extended H\"uckel Theory (EHT) prescriptions. For the non-orthogonal method, TB parameters are given for both zincblend and wurtzite crystalline structures.

Keywords

Cite

@article{arxiv.1608.04715,
  title  = {Orthogonal and Non-Orthogonal Tight Binding parameters for III-V Semiconductors Nitrides},
  author = {A. S. Martins and C. E. Fellows},
  journal= {arXiv preprint arXiv:1608.04715},
  year   = {2016}
}

Comments

11 pages, 1 figure, accepted for publication in the Brazilian Journal of Physics