Optimizing the quality factor of InP nanobeam cavities using atomic layer deposition
Abstract
Photonic crystal nanobeam cavities are valued for their small mode volume, CMOS compatibility, and high coupling efficiency crucial features for various low-power photonic applications and quantum information processing. However, despite their potential, nanobeam cavities often suffer from low quality factors due to fabrication imperfections that create surface states and optical absorption. In this work, we demonstrate InP nanobeam cavities with up to 140% higher quality factors by applying a coating of AlO via atomic layer deposition to terminate dangling bonds and reduce surface absorption. Additionally, changing the deposition thickness allows precise tuning of the cavity mode wavelength without compromising the quality factor. This AlO atomic layer deposition approach holds great promise for optimizing nanobeam cavities that are well-suited for integration with a wide range of photonic applications.
Cite
@article{arxiv.2312.05967,
title = {Optimizing the quality factor of InP nanobeam cavities using atomic layer deposition},
author = {Mohammad Habibur Rahaman and Chang-Min Lee and Mustafa Atabey Buyukkaya and Samuel Harper and Fariba Islam and Edo Waks},
journal= {arXiv preprint arXiv:2312.05967},
year = {2023}
}