English

Non-monotonic roughness evolution in film growth on weakly interacting substrates

Materials Science 2026-01-27 v1 Soft Condensed Matter Applied Physics Chemical Physics

Abstract

Thin film deposition on weakly interacting substrates exhibits a unique growth mode characterized by initially strong island formation and rapidly increasing roughness, which reaches a maximum and subsequently decreases as the film returns to a smooth morphology. Here we show this rough-to-smooth growth mode experimentally for two molecular systems with substantially different geometries, namely, the effectively spherical buckminsterfullerene (C60_{60}) and the disk-like 1,4,5,8,9,11-hexaazatriphenylenehexacarbonitrile (HATCN). This growth mode is explained by a geometrical model that captures the basic mechanisms of multilayer island growth, island coalescence, and formation of a continuous film. Additionally, kinetic Monte Carlo simulations with minimal ingredients demonstrate that this mode generally occurs for weakly interacting substrates, providing quantitative estimates of parameters that characterize adsorbate-adsorbate and adsorbate-substrate interactions. Both the model and simulations accurately describe the experimental data and highlight the generic nature of the phenomenon, independently of the details of the interactions and the molecular flux, which opens up a path for controlling nanoscale film roughness.

Keywords

Cite

@article{arxiv.2601.17487,
  title  = {Non-monotonic roughness evolution in film growth on weakly interacting substrates},
  author = {Dmitry Lapkin and Ismael S. S. Carrasco and Catherine Cruz Luukkonen and Oleg Konovalov and Alexander Hinderhofer and Frank Schreiber and Fábio D. A. Aarão Reis and Martin Oettel},
  journal= {arXiv preprint arXiv:2601.17487},
  year   = {2026}
}

Comments

Accepted to Physical Review Letters