Nanophotonic Pockels modulators on a silicon nitride platform
Abstract
Silicon nitride (SiN) is emerging as a competitive platform for CMOS-compatible integrated photonics. However, active devices such as modulators are scarce and still lack in performance. Ideally, such a modulator should have a high bandwidth, good modulation efficiency, low loss, and cover a wide wavelength range. Here, we demonstrate the first electro-optic modulators based on ferroelectric lead zirconate titanate (PZT) films on SiN, in both the O- and the C-band. Bias-free operation, bandwidths beyond 33 GHz and data rates of 40 Gbps are shown, as well as low propagation losses ( dB/cm). A 3.2 Vcm is measured. Simulations indicate that values below 2 Vcm are achievable. This approach offers a much-anticipated route towards high-performance phase modulators on SiN.
Keywords
Cite
@article{arxiv.1805.05437,
title = {Nanophotonic Pockels modulators on a silicon nitride platform},
author = {Koen Alexander and John P. George and Jochem Verbist and Kristiaan Neyts and Bart Kuyken and Dries Van Thourhout and Jeroen Beeckman},
journal= {arXiv preprint arXiv:1805.05437},
year = {2018}
}
Comments
Koen Alexander and John P. George contributed equally to this work