English

Nanofabrication of spin-transfer torque devices by a PMMA mask one step process: GMR versus single layer devices

Materials Science 2007-11-21 v1

Abstract

We present a method to prepare magnetic spin torque devices of low specific resistance in a one step lithography process. The quality of the pillar devices is demonstrated for a standard magnetic double layer device. For single layer devices, we found hysteretic switching and a more complex dynamical excitation pattern in higher fields. A simple model to explain the resistance spikes is presented.

Keywords

Cite

@article{arxiv.cond-mat/0610277,
  title  = {Nanofabrication of spin-transfer torque devices by a PMMA mask one step process: GMR versus single layer devices},
  author = {Anne Parge and Tore Niermann and Michael Seibt and Markus Münzenberg},
  journal= {arXiv preprint arXiv:cond-mat/0610277},
  year   = {2007}
}

Comments

22 pages, 6 figures, submitted to J. Appl. Phys