English

Multi-Modal Instruction-Tuning Small-Scale Language-and-Vision Assistant for Semiconductor Electron Micrograph Analysis

Computer Vision and Pattern Recognition 2024-09-13 v1 Machine Learning

Abstract

We present a novel framework for analyzing and interpreting electron microscopy images in semiconductor manufacturing using vision-language instruction tuning. The framework employs a unique teacher-student approach, leveraging pre-trained multimodal large language models such as GPT-4 to generate instruction-following data for zero-shot visual question answering (VQA) and classification tasks, customizing smaller multimodal models (SMMs) for microscopy image analysis, resulting in an instruction-tuned language-and-vision assistant. Our framework merges knowledge engineering with machine learning to integrate domain-specific expertise from larger to smaller multimodal models within this specialized field, greatly reducing the need for extensive human labeling. Our study presents a secure, cost-effective, and customizable approach for analyzing microscopy images, addressing the challenges of adopting proprietary models in semiconductor manufacturing.

Keywords

Cite

@article{arxiv.2409.07463,
  title  = {Multi-Modal Instruction-Tuning Small-Scale Language-and-Vision Assistant for Semiconductor Electron Micrograph Analysis},
  author = {Sakhinana Sagar Srinivas and Geethan Sannidhi and Venkataramana Runkana},
  journal= {arXiv preprint arXiv:2409.07463},
  year   = {2024}
}

Comments

Paper published at AAAI 2024 Spring Symposium Series

R2 v1 2026-06-28T18:41:34.601Z